Optimal Oscillation Region for A6 Magnetron via Mode Competition Analysis of Cross-Sectional Vector Electric Fields

IF 1.6 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2026-10-01 Epub Date: 2026-09-23 DOI:10.1109/TPS.2026.3729983

Dong-Hyun Oh;Young-Wook Kim;Jung-Hoon Han

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引用次数: 0

Abstract

Relativistic magnetrons (RMs), a class of high-power microwave (HPM) sources, have attracted significant attention across various industrial applications. Under specific operating conditions, RMs experience mode competition, which leads to variations in critical performance metrics such as oscillation efficiency and rise time. While optimal operating conditions have been previously proposed for strapped magnetrons, applying these formulations to unstrapped magnetrons is challenging due to inherent differences in their operational characteristics. Accordingly, this article proposes a novel optimal operating condition applicable to the A6 magnetron—a representative unstrapped RM—based on the analysis of mode competition. The proposed mathematical formulation is designed by utilizing the frequencies and electric field components, including both magnitudes and phases, of the operating mode and the adjacent competing mode. Simulation results demonstrate that the proposed formulation yields a significantly higher oscillation efficiency and a shorter 90% rise time compared to the conventional formulation.

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基于横截面矢量电场模式竞争分析的A6磁控管最佳振荡区域

相对论磁控管（RMs）是一类高功率微波（HPM）源，在各种工业应用中引起了极大的关注。在特定的运行条件下，rm经历模式竞争，导致振荡效率和上升时间等关键性能指标的变化。虽然先前已经提出了捆扎磁控管的最佳工作条件，但由于其工作特性的固有差异，将这些公式应用于非捆扎磁控管是具有挑战性的。据此，本文在模式竞争分析的基础上，提出了一种适用于A6型磁控管的新型最优运行工况——一种具有代表性的无约束磁控管。利用工作模式和相邻竞争模式的频率和电场分量（包括幅值和相位）设计了所提出的数学公式。仿真结果表明，与传统配方相比，该配方的振荡效率显著提高，上升时间缩短了90%。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.