{"title":"Revisiting the 1-D Theoretical Limit of Wide Bandgap Semiconductor Power Devices via Variational Calculus","authors":"Bo Li;Maojun Wang;Jin Wei;Bo Shen","doi":"10.1109/LED.2026.3726530","DOIUrl":null,"url":null,"abstract":"In wide-bandgap semiconductors with strongly nonlinear impact ionization coefficients, classical monotonic doping profiles may limit the reduction of specific on-resistance (<inline-formula> <tex-math>${R}_{\\text {on},\\text {sp}}$ </tex-math></inline-formula>) under avalanche-breakdown constraints. A variational formulation shows that a non-monotonic, U-shaped profile can emerge as a candidate solution. DE optimization and TCAD simulations further support its performance advantage: a steep surface electric-field gradient spatially confines avalanche generation. Consequently, the U-shaped profile achieves a lower <inline-formula> <tex-math>${R}_{\\text {on},\\text {sp}}$ </tex-math></inline-formula> than uniform and conventional monotonic profiles while meeting the required voltage-blocking capability, providing guidance for doping-profile optimization in advanced power devices.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"47 10","pages":"1983-1986"},"PeriodicalIF":4.6000,"publicationDate":"2026-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11668827/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2026/8/27 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
In wide-bandgap semiconductors with strongly nonlinear impact ionization coefficients, classical monotonic doping profiles may limit the reduction of specific on-resistance (${R}_{\text {on},\text {sp}}$ ) under avalanche-breakdown constraints. A variational formulation shows that a non-monotonic, U-shaped profile can emerge as a candidate solution. DE optimization and TCAD simulations further support its performance advantage: a steep surface electric-field gradient spatially confines avalanche generation. Consequently, the U-shaped profile achieves a lower ${R}_{\text {on},\text {sp}}$ than uniform and conventional monotonic profiles while meeting the required voltage-blocking capability, providing guidance for doping-profile optimization in advanced power devices.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.