A Unified Model for MoS2 FETs Transfer Characteristic Based on Cubic Bezier Curves

IF 3.6 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
IEEE Transactions on Electron Devices Pub Date : 2026-09-01 Epub Date: 2026-07-21 DOI:10.1109/TED.2026.3713144
Xing Su;Ziji Wang;Yifan Yuan;Min Sun;Yifei Zhang;Si-Ping Gao
{"title":"A Unified Model for MoS2 FETs Transfer Characteristic Based on Cubic Bezier Curves","authors":"Xing Su;Ziji Wang;Yifan Yuan;Min Sun;Yifei Zhang;Si-Ping Gao","doi":"10.1109/TED.2026.3713144","DOIUrl":null,"url":null,"abstract":"This article presents a unified compact model for the transfer characteristics of MoS2 field-effect transistors (FETs) based on cubic Bezier curves. The model is constructed by combining an area-gap criterion with a physics-based endpoint-reconstruction method. The area-gap criterion is used to determine the fitting window and the minimum polynomial order required for accurate representation, while the endpoint-reconstruction method maps physics-based endpoint current and derivative constraints into Bezier control points, thereby yielding a unified analytical expression. Key effects, including interface traps, drain-induced barrier lowering (DIBL), mobility degradation, and velocity saturation, are incorporated through endpoint constraints. The proposed model is explicit, nonpiecewise, and continuously differentiable from deep subthreshold to strong inversion. Validation results show good agreement with measured transfer characteristics under different device dimensions and bias conditions while accurately reproducing transconductance and higher order derivative behavior. The proposed model is therefore suitable for parameter extraction and circuit simulation of MoS2 FETs.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"73 9","pages":"5387-5394"},"PeriodicalIF":3.6000,"publicationDate":"2026-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11615049/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2026/7/21 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

This article presents a unified compact model for the transfer characteristics of MoS2 field-effect transistors (FETs) based on cubic Bezier curves. The model is constructed by combining an area-gap criterion with a physics-based endpoint-reconstruction method. The area-gap criterion is used to determine the fitting window and the minimum polynomial order required for accurate representation, while the endpoint-reconstruction method maps physics-based endpoint current and derivative constraints into Bezier control points, thereby yielding a unified analytical expression. Key effects, including interface traps, drain-induced barrier lowering (DIBL), mobility degradation, and velocity saturation, are incorporated through endpoint constraints. The proposed model is explicit, nonpiecewise, and continuously differentiable from deep subthreshold to strong inversion. Validation results show good agreement with measured transfer characteristics under different device dimensions and bias conditions while accurately reproducing transconductance and higher order derivative behavior. The proposed model is therefore suitable for parameter extraction and circuit simulation of MoS2 FETs.
基于三次Bezier曲线的MoS2场效应管转移特性统一模型
本文提出了一种基于三次贝塞尔曲线的二硫化钼场效应晶体管转移特性的统一紧凑模型。该模型采用面积间隙准则和基于物理的端点重建方法相结合的方法构建。区域间隙准则用于确定拟合窗口和精确表示所需的最小多项式阶数,而端点重建方法将基于物理的端点电流和导数约束映射到贝塞尔控制点,从而产生统一的解析表达式。关键的影响,包括界面陷阱、排水诱导的势垒降低(DIBL)、迁移率下降和速度饱和,都是通过端点约束纳入的。该模型具有显式、非分段、从深度亚阈值到强反演的连续可微性。验证结果显示,在不同的器件尺寸和偏置条件下,与测量的转移特性吻合良好,同时准确地再现了跨导和高阶导数行为。因此,该模型适用于MoS2场效应管的参数提取和电路仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信
小红书