Investigation on Switching Characteristic Degradation and Single-Event Burnout Mechanism Caused by Ta Heavy Ions in p-GaN Gate HEMTs

IF 3.6 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
IEEE Transactions on Electron Devices Pub Date : 2026-09-01 Epub Date: 2026-07-14 DOI:10.1109/TED.2026.3709773
Xuejing Sun;Shenglei Zhao;Xiufeng Song;Kunshu Wang;Lin Du;Zebin Kong;Longyang Yu;Shengrui Xu;Ga Zhang;Zhongxu Wang;Yachao Zhang;Shuzhen You;Yue Hao;Jincheng Zhang
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引用次数: 0

Abstract

In this article, we investigate the switching characteristic degradation and single-event burnout mechanism of Ta high-energy particles on the p-GaN gate HEMTs under high-voltage bias. The irradiated device saturation current decreases and the on-resistance increases. The gate leakage current increases by two and three orders of magnitude at off and on states. The dynamic switching characteristics of irradiated devices in the circuit are characterized for the first time through double-pulse test (DPT). It is found that the conduction ability of irradiated devices is seriously affected at conduction state. Under 350-V high-voltage bias stress, the turn-on/off time of irradiated device increases by 20/12 ns and turn-on/off loss increases by 10.19/ $1.39~\mu $ J at ${V}_{\text {DS}} = {75}$ V. In addition, an obvious burnout point is viewed on the drain electrode. More significantly, high-energy incident particle Ta element is directly observed in the failure cavities for the first time. The potential burnout mechanism may be the heat accumulation in the GaN and substrate materials is difficult to release in a short time, resulting in the formation of cavities. The single-event effect (SEE) research of Ta particles on the p-GaN gate HEMTs is greatly significant on the development of GaN-based devices aerospace technology application in radiation environment.
Ta重离子对p-GaN栅极hemt开关特性退化及单事件烧坏机制的研究
在本文中,我们研究了高压偏压下Ta高能粒子在p-GaN栅极hemt上的开关特性退化和单事件烧坏机制。辐照器件饱和电流减小,导通电阻增大。栅极漏电流在关断和导通状态下分别增加两个和三个数量级。通过双脉冲测试,首次对电路中辐照器件的动态开关特性进行了表征。研究发现,辐照器件在导通状态下的导通能力受到严重影响。在350 V高压偏置应力下,辐照器件在${V}_{\text {DS}} = {75}$ V处的通断时间增加了20/12 ns,通断损耗增加了10.19/ $1.39~\mu $ J,漏极上出现了明显的烧坏点。更重要的是,首次在失效腔中直接观察到高能入射粒子Ta元素。潜在的烧坏机制可能是氮化镓和衬底材料中的热量积累难以在短时间内释放,导致空腔的形成。研究Ta粒子对p-GaN栅极hemt的单事件效应对gan基器件在辐射环境中的应用具有重要意义。
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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