Nonvolatile OR Logic Gates Enabled by Single Quad-RRAM Device

IF 3.6 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
IEEE Transactions on Electron Devices Pub Date : 2026-09-01 Epub Date: 2026-07-23 DOI:10.1109/TED.2026.3714363
Wenjin Yang;Yang Shen;Chunxin Li;Yuhao Zhou;Ziming Wang;Wenxuan Sun;Peng Liu;Ziyu Liu;Xiaoxin Xu;He Tian;Yabin Sun
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引用次数: 0

Abstract

Implementing energy-efficient in-memory computing with minimized hardware overhead remains a critical challenge. In this study, a monolithically integrated quad-resistive random access memory (RRAM) device is proposed and experimentally verified for area-efficient “OR” logic operations. A vertically stacked TiN/HfO2/Pt/HfO2/TiN structure is adopted to integrate four RRAM cells within a single device footprint. The intermediate common electrode is utilized to effectively decouple the potential distributions of the upper and lower layers, thereby enabling parallel multiport excitation without electrical crosstalk. To elucidate the underlying physics, a 3-D kinetic Monte Carlo (KMC) simulation framework is established to visualize the field-driven stochastic filamentary evolution. Compared with conventional CMOS-based “OR” logic gates, the device count for the proposed device is reduced from 6 to 1, and correspondingly, the footprint can be saved by 83.3%. Furthermore, zero static power consumption is achieved due to the nonvolatility of the HfO2 layer. This single-device logic paradigm demonstrates high potential for high-density 3-D integrated computing systems.
非易失性OR逻辑门由单个Quad-RRAM器件启用
在最小化硬件开销的情况下实现节能的内存计算仍然是一个关键的挑战。在这项研究中,提出了一种单片集成四阻随机存取存储器(RRAM)器件,并通过实验验证了该器件用于面积高效的“或”逻辑运算。采用垂直堆叠的TiN/HfO2/Pt/HfO2/TiN结构,在单个器件占地面积内集成了四个RRAM单元。利用中间共电极有效地解耦了上下两层的电位分布,从而实现了无电串扰的并行多端口激励。为了阐明潜在的物理特性,建立了三维动力学蒙特卡罗(KMC)模拟框架,以可视化场驱动的随机细丝演化。与传统的基于cmos的“或”逻辑门相比,该器件的器件数从6个减少到1个,相应的,可节省83.3%的占地面积。此外,由于HfO2层的非挥发性,实现了零静态功耗。这种单器件逻辑范例显示了高密度三维集成计算系统的巨大潜力。
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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