Study of a Non-Enzymatic Lactic Acid Sensor Modified by MoO3/TiO2 and Its Measurement by Potentiometric Equipment

IF 2.5 4区工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC

IEEE Transactions on Nanotechnology Pub Date : 2026-01-01 Epub Date: 2026-04-30 DOI:10.1109/TNANO.2026.3689179

Yu-Hsun Nien;Pei-Ling Lin;Jung-Chuan Chou;Chih-Hsien Lai;Po-Hui Yang;Po-Yu Kuo;Xin-Han Chen;Yu-Wei Chen;Lian-Sheng Jiang

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引用次数: 0

Abstract

This study presents the fabrication and characterization of a non-enzymatic lactic acid (LA) sensor using a MoO₃/TiO₂ composite, developed through a straightforward drop-casting method on a flexible printed circuit board (FPCB). The synergistic combination of redox-active MoO₃ and porous TiO₂ significantly enhances electrochemical performance by increasing surface area and facilitating efficient ion exchange and electron transfer. The sensor exhibits excellent sensitivity (3.65 mV/mM), strong linearity (R² = 0.997), high selectivity against common interferents (e.g., uric acid, dopamine, glucose), and rapid response time (∼7 seconds). It also demonstrates good repeatability (RSD = 3.25%) and reproducibility (RSD = 13%) across multiple fabrications. Notably, the limit of detection (LOD) is calculated to be 0.43 mM, indicating the sensor's capability for detecting low concentrations of lactic acid. These results highlight the sensor's potential for real-time, low-cost, and reliable LA monitoring in biomedical applications.

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MoO3/TiO2修饰的非酶乳酸传感器的研究及其电位仪测量

本研究介绍了使用MoO3/TiO2复合材料在柔性印刷电路板（FPCB）上直接滴铸法开发的非酶乳酸（LA）传感器的制造和表征。氧化还原活性MoO3和多孔TiO2的协同组合通过增加表面积，促进高效的离子交换和电子转移，显著提高了电化学性能。该传感器具有优异的灵敏度（3.65 mV/mM），强线性（R2 = 0.997），对常见干扰（如尿酸，多巴胺，葡萄糖）的高选择性和快速响应时间（~ 7秒）。它也显示出良好的重复性（RSD = 3.25%）和再现性（RSD = 13%）跨多种制造。值得注意的是，检测限（LOD）计算为0.43 mM，表明传感器检测低浓度乳酸的能力。这些结果突出了传感器在生物医学应用中实时、低成本和可靠的LA监测的潜力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Nanotechnology 工程技术-材料科学：综合

CiteScore

4.80

自引率

8.30%

发文量

审稿时长

8.3 months

期刊介绍： The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.