Evaluating the Impact of Emerging Contaminants on Membrane Performance in Ultrapure-Water Production for Semiconductor Manufacturing: A PRISMA-Directed Meta-Analysis

Abstract

Ultrapure water (UPW) is indispensable in semiconductor manufacturing, where it serves as the foundational input for wafer cleaning, chemical dilution, and rinsing steps. As device geometries shrink below 5 nm, even parts-per-trillion (ppt) levels of contaminants can compromise yield, reliability, and compliance with industry standards such as SEMI F63 and ASTM D5127. Emerging contaminants (ECs) including per- and polyfluoroalkyl substances (PFAS), pharmaceuticals and personal care products (PPCPs), chemical mechanical planarization (CMP) organics, and micro/nanoplastics pose new challenges for membrane-based UPW treatment systems, especially under evolving regulations like the EPA PFAS Rule (2024). This PRISMA-guided meta-analysis evaluates 31 peer-reviewed studies (2002–2025) to quantify how reverse osmosis (RO), nanofiltration (NF), and ultrafiltration (UF) membranes perform under EC exposure. RO consistently achieved >99% rejection for long-chain PFAS and PPCPs but showed lower efficacy (93.8–99.2%) for short-chain compounds. NF demonstrated variable rejection (86–98%) depending on compound characteristics but offered energy savings in suitable contexts. UF was effective for microplastics but suffered significant flux decline (15–45%) with CMP-related organics. These findings offer critical, data-driven insights for semiconductor facilities seeking to maintain compliance, reduce operating costs, and optimize yield amid stricter water quality demands.