Investigation of Effective Electrode Configuration From Composite Materials Using Pulsed Discharge for Metal Removal

IF 1.5 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2026-04-01 Epub Date: 2025-10-28 DOI:10.1109/TPS.2025.3620423

Takuto Doi;Shota Oishi;Takashi Sakugawa;Kaisei Nishimura;Shinichiro Shobako;Shin'ichi Shimasaki;Tomohiko Yamashita

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引用次数: 0

Abstract

Pulsed power technology has been studied for e-waste recycling. Applying pulsed discharge can separate composite materials into plastics and metals. This study separates metal and plastic components in indium tin oxide (ITO)-coated polyethylene terephthalate (PET) film. We investigated an effective electrode configuration for metal removal from composite materials using pulsed discharge. We used two distinct electrode configurations: rod-to-rod electrodes and plate-to-plate electrodes. A series of single-pulse discharges were applied at various electrode distances. As a result, the flat plate electrodes demonstrated superior metal removal, achieving an area 3.6 times larger than the rod electrodes at a 20-mm electrode gap. Analysis of the current density and comparison to the target condition revealed that the current density greatly affected the metal removal area. Maximizing the removal area during the recycling process by pulsed power is possible with a suitable electrode configuration.

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脉冲放电去除金属的复合材料有效电极结构研究

研究了脉冲功率技术在电子垃圾回收中的应用。利用脉冲放电可以将复合材料分离成塑料和金属。本研究分离了氧化铟锡（ITO）涂层的聚对苯二甲酸乙二醇酯（PET）薄膜中的金属和塑料成分。我们研究了一种利用脉冲放电从复合材料中去除金属的有效电极配置。我们使用了两种不同的电极配置：棒对棒电极和板对板电极。在不同的电极距离上施加一系列单脉冲放电。结果，平板电极显示出优越的金属去除效果，在20毫米电极间隙处，其面积是棒电极的3.6倍。通过对电流密度的分析，并与靶条件进行对比，发现电流密度对金属去除面积的影响较大。通过适当的电极配置，可以通过脉冲功率在回收过程中最大化去除面积。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.