Low-Stray-Inductance Integrated Press-Pack Technology for Multidie Reversely Switched Dynistor Stacks

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
IEEE Transactions on Plasma Science Pub Date : 2026-04-01 Epub Date: 2026-01-29 DOI:10.1109/TPS.2026.3655957
Yiliang Lv;Ning Wang;Zhiwei Kang;Wenbo Yang;Aoming Ge
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引用次数: 0

Abstract

To address the issues of high stray inductance, large volume, and excessive weight in conventional series-connected reversely switched dynistor (RSD) stack, this study proposes an integrated multidie press-pack technology utilizing RSD bare dies. By optimizing the structural design of the stack and directly press-packing bare dies under mechanical pressure, this technology significantly reduces the stack stray inductance while achieving miniaturization and weight reduction. Based on this approach, a 12-die series-connected integrated press-pack RSD stack was designed and manufactured. The stack exhibits an overall voltage withstand capability suitable for high-voltage applications and has been experimentally verified to conduct a 10-kA pulse current. Key performance tests demonstrate that the stack stray inductance is only 280 nH, representing a 49% reduction compared to a conventional stack composed of nine packaged RSD chips.
多模反向开关电阻器堆叠的低杂散电感集成压封装技术
为了解决传统串联反向开关电源(RSD)堆叠中杂散电感高、体积大、重量过重的问题,本研究提出了一种利用RSD裸模的集成多模压包技术。该技术通过优化电堆结构设计,在机械压力下直接压封装裸模,显著降低了电堆杂散电感,同时实现了小型化和轻量化。基于该方法,设计并制造了一个12模串联的集成压封装RSD堆栈。该堆叠具有适合高压应用的整体耐压能力,并已通过实验验证可传导10ka脉冲电流。关键性能测试表明,堆叠杂散电感仅为280 nH,与由9个封装RSD芯片组成的传统堆叠相比,减少了49%。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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