{"title":"Low-Temperature Polymer Removal to Boost Solution Processed Carbon Nanotube Thin Film Transistor Performance","authors":"Haitao Zhang;Xiaojia Yin;Hui Wang;Zebang Luo;Yulong Yuan;Li Xiang","doi":"10.1109/TNANO.2026.3663466","DOIUrl":null,"url":null,"abstract":"Carbon nanotubes (CNTs) offer exceptional electrical properties for the next-generation thin-film transistors (TFTs). However, the residual conjugated polymers introduced from the solution processes degrade the device performance. Here, a low-temperature (below 150 °C) post-treatment method is developed to remove wrapping polymers from CNT while preserving CNT integrity (G<sup>+</sup>/D ratio: 18.17 to 16.97). This silicon-compatible technique avoids harsh chemicals and high-temperature annealing, simultaneously improving the devices performance (2.9× higher mobility, 2.4× higher on-current, and lower subthreshold swing), and uniformity. This low-temperature, acid-free approach facilitates the application of CNT TFTs in wearable electronics and display backplanes.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"25 ","pages":"60-63"},"PeriodicalIF":2.1000,"publicationDate":"2026-02-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11389126/","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Carbon nanotubes (CNTs) offer exceptional electrical properties for the next-generation thin-film transistors (TFTs). However, the residual conjugated polymers introduced from the solution processes degrade the device performance. Here, a low-temperature (below 150 °C) post-treatment method is developed to remove wrapping polymers from CNT while preserving CNT integrity (G+/D ratio: 18.17 to 16.97). This silicon-compatible technique avoids harsh chemicals and high-temperature annealing, simultaneously improving the devices performance (2.9× higher mobility, 2.4× higher on-current, and lower subthreshold swing), and uniformity. This low-temperature, acid-free approach facilitates the application of CNT TFTs in wearable electronics and display backplanes.
期刊介绍:
The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.