Site-specific Mg doping in LaFeO3 perovskites: Tuning photophysical behavior and trap-state dynamics

IF 5.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Asmida Herawati , Hoerudin Bayu Hidayah , Rifqi Almusahwi Rafsanjani , Eri Widianto , Affi Nur Hidayah , Edi Suprayoga , Isnaeni , Djoko Triyono , Suryadi
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引用次数: 0

Abstract

Lanthanum ferrite (LaFeO3) perovskite offers high structural stability and strong visible-light absorption, yet its optoelectronic response is frequently limited by trap-assisted losses and non-radiative recombination. Here, we systematically assess site-specific Mg doping by comparing substitution at La3+ (A-site) and Fe3+ (B-site) in LaFeO3 thin films, and we establish a unified structure–defect–property correlation by combining XRD, FE-SEM, UV–Vis DRS, PL, XPS, dark electrochemical impedance spectroscopy, and DFT(+U) defect formation-energy calculations. Moderate B-site Mg substitution (x = 0.1, LFM01) delivers the most favorable film quality, with compact grains and a controlled oxygen-vacancy population. Power-dependent PL yields β values approaching unity (β ≈ 1.0), narrower emission linewidths, and negative exciton binding energies, consistent with a defect-optimized regime where recombination becomes more delocalized and band-to-band–like. In contrast, A-site Mg doping (LMF01) exhibits a higher β exponent (β ≈ 1.3) together with positive exciton binding energies and broadened, strongly quenched PL, indicating recombination dominated by deep, strongly localized non-radiative traps. At higher B-site loading (LFM03), vacancy clustering drives a defect-saturated regime marked by reduced PL efficiency, broader emission, and β < 1 (β ≈ 0.9). Dark EIS identifies LFM01 as the most conductive film (lowest transport resistance), while DFT confirms Fe-site Mg is thermodynamically favored and lowers the oxygen-vacancy formation energy, rationalizing the coupled defect, photophysical, and transport trends. These findings highlight the critical role of dopant site selectivity in modulating defect states and recombination dynamics, offering valuable insights for optimizing LaFeO3-based materials for future optoelectronic technologies.
特定位置的Mg掺杂在LaFeO3钙钛矿中:调整光物理行为和阱态动力学
镧铁氧体(LaFeO3)钙钛矿具有高的结构稳定性和强的可见光吸收,但其光电响应经常受到陷阱辅助损失和非辐射复合的限制。本文通过比较LaFeO3薄膜中La3+ (a位)和Fe3+ (b位)的取代,系统地评价了位特异性Mg掺杂,并结合XRD、FE-SEM、UV-Vis DRS、PL、XPS、暗电化学阻抗谱和DFT(+U)缺陷形成-能量计算,建立了统一的结构-缺陷-性能相关性。适度的b位Mg取代(x = 0.1, LFM01)提供了最有利的薄膜质量,具有致密的颗粒和可控的氧空位人口。功率相关的PL产生接近1 (β≈1.0)的β值,更窄的发射线宽和负激子结合能,与缺陷优化的机制一致,重组变得更加离域和带到带。相比之下,a位Mg掺杂(LMF01)表现出更高的β指数(β≈1.3)、正激子结合能和加宽、强猝灭的PL,表明重组以深、强局域非辐射陷阱为主。在较高的b位负载(LFM03)下,空位聚集驱动缺陷饱和状态,其特征是PL效率降低,发射更宽,β < 1 (β≈0.9)。Dark EIS发现LFM01是最导电的薄膜(最低的输运电阻),而DFT证实Fe-site Mg在热力学上是有利的,并且降低了氧空位形成能,使耦合缺陷、光物理和输运趋势合理化。这些发现突出了掺杂点选择性在调节缺陷状态和重组动力学中的关键作用,为优化未来光电技术中基于lafeo3的材料提供了有价值的见解。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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