Integrated Spatiotemporal Multiscale- Multiphysics-Uncertainty Simulation for Controlling Variability in RRAM Devices

IF 2.7 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE
Ziyan Liao;Zhiheng Huang;Min Xiao;Yuezhong Meng;Hui Yan;Yang Liu
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引用次数: 0

Abstract

Resistive random access memory (RRAM) is a leading candidate for next-generation nonvolatile memory and neuromorphic computing. However, its performance is limited by inherent switching variability and uncertainties in spatiotemporal multiscale materials and processes. This study integrates multiphysics and multiscale modeling with uncertainty quantification (UQ) to systematically address these limitations and reduce uncertainties. UQ identifies critical inputs that govern key performance metrics, including theON/OFF ratio, forming voltage, and power consumption, reducing their statistical distributions with the probabilities of reliability analysis over 92%. The phase field model (PFM) captures the morphological evolution of conductive filament (CF) and, by incorporating a second-order time derivative for ion diffusion, reveals the impact of morphological fluctuations governing RRAM behavior. Drift diffusion simulations further demonstrate that bilayer structures confine CF fractures to the HfO2 layer through interfacial constraints. This modeling framework provides a systematic approach to mitigate variability and improve the design and reliability of RRAM devices.
集成时空多尺度-多物理场-不确定性模拟用于控制RRAM器件的可变性
电阻式随机存取存储器(RRAM)是下一代非易失性存储器和神经形态计算的主要候选者。然而,其性能受到时空多尺度材料和工艺中固有的开关可变性和不确定性的限制。本研究将多物理场和多尺度建模与不确定性量化(UQ)相结合,系统地解决了这些限制并减少了不确定性。UQ识别控制关键性能指标的关键输入,包括theON/OFF比率、成型电压和功耗,降低其统计分布,可靠性分析概率超过92%。相场模型(PFM)捕获了导电丝(CF)的形态演变,并通过结合离子扩散的二阶时间导数,揭示了形态波动对RRAM行为的影响。漂移扩散模拟进一步表明,双层结构通过界面约束将CF裂缝限制在HfO2层。该建模框架提供了一种系统的方法来减轻可变性,提高RRAM器件的设计和可靠性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
5.00
自引率
4.20%
发文量
11
审稿时长
13 weeks
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