Enhanced Operational Stability of Flexible Carbon Nanotube Thin Film Transistors Using Low-Temperature Post-Treatment

Haitao Zhang;Xiongfeng Zou;Jian Hu;Hui Wang;Li Xiang
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Abstract

Carbon nanotubes (CNTs) have been extensively investigated as channel materials for flexible electronics, owing to their inherent flexibility, high carrier mobility, ultrathin body, and solution-based, low-temperature processibility. However, achieving robust operation of CNT thin-film transistors (TFTs) under repeated bias cycling in air, a crucial requirement for complex and large-scale circuits, remains a challenge. In this work, we present a low-temperature hexamethyldisilazane (HMDS) post-treatment (150 °c) to enhance the robustness of flexible, bottom-gated CNT TFTs. This treatment significantly reduces device hysteresis and improves threshold voltage (Vth) stability under repeated bias cycling, decreasing the relative standard deviation (Sr) of Vth from 136% to 34.1% and from 77.3% to 4.23% under different measurement modes. The mechanisms underlying this Vth stability enhancement are primarily attributed to a significant reduction in device surface traps: (1) prolonged 150 °C post-treatment in a vacuum oven promotes the desorption of oxygen and water molecules from the active layer and dielectric surface; (2) HMDS reacts with polar hydroxyl groups on the device surface, generating hydrophobic, non-polar methyl groups, thereby reducing surface charge accumulation; and (3) the hydrophobic nature of the HMDS layer on the device surface contributes to insulating the device from ambient oxygen and water molecules.
低温后处理提高柔性碳纳米管薄膜晶体管的工作稳定性
碳纳米管(CNTs)由于其固有的柔韧性、高载流子迁移率、超薄体以及基于溶液的低温可加工性,已被广泛研究作为柔性电子器件的通道材料。然而,实现碳纳米管薄膜晶体管(TFTs)在空气中反复偏置循环下的鲁棒工作仍然是一个挑战,这是复杂和大规模电路的关键要求。在这项工作中,我们提出了一种低温六甲基二氮杂烷(HMDS)后处理(150°c),以增强柔性底门控碳纳米管tft的稳健性。该处理显著降低了器件迟滞,提高了重复偏置循环下阈值电压(Vth)的稳定性,不同测量模式下Vth的相对标准偏差(Sr)从136%降低到34.1%,从77.3%降低到4.23%。这种Vth稳定性增强的机制主要归因于器件表面陷阱的显著减少:(1)在真空炉中延长150°C的后处理促进了活性层和介电表面的氧和水分子的解吸;(2) HMDS与器件表面的极性羟基发生反应,生成疏水的非极性甲基,从而减少表面电荷积累;(3)器件表面HMDS层的疏水性有助于器件与环境氧和水分子绝缘。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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