{"title":"Design of high robustness DDSCR with embedded gate-controlled diodes and Schottky diodes","authors":"Yitao Wang , Shuoxin Ji , Yang Wang","doi":"10.1016/j.sse.2025.109283","DOIUrl":null,"url":null,"abstract":"<div><div>Due to the harsh working environments of Input/Output (I/O) pins, the electro-static discharge (ESD) protection devices of these ports often require high robustness. To design highly robust ESD protection devices with dual polarities, the Gate-controlled dual direction silicon controlled rectifier (GCDDSCR) and a DDSCR embedded with Schottky barrier diode (SBD-GCDDSCR) structures are designed and studied in this article as standalone devices for primary protection. The gate-controlled diodes and Schottky diodes are integrated into the simple DDSCR structure to enhance its robustness while reducing the on-resistance. The inclusion of gate diodes introduced an additional current path near the surface, improving space utilization in the longitudinal direction of the device, and the addition of Schottky junctions placed adjacent to the Anode and Cathode can provide additional electron extraction paths. Both methods contribute in a more uniform current distribution, improving the robustness of the device. Two-dimensional device simulation based on a classical set of equations was employed to investigate its electrical behavior during an ESD event. Based on the 0.18 μm CMOS process, all structures were fabricated into 6-finger devices with a finger length of 50 μm. The Transmission Line Pulse (TLP) testing method was used to evaluate their ESD characteristics, revealing that the addition of the gate-controlled diodes and Schottky shunt paths improved robustness. The proposed SBD-GCDDSCR structure demonstrated superior robustness under ESD stress, with a failure current exceeding 19 A in both forward and reverse directions, and its V<sub>t2</sub> in strong saturation regime is around 48 V.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"231 ","pages":"Article 109283"},"PeriodicalIF":1.4000,"publicationDate":"2026-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S003811012500228X","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/11/2 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Due to the harsh working environments of Input/Output (I/O) pins, the electro-static discharge (ESD) protection devices of these ports often require high robustness. To design highly robust ESD protection devices with dual polarities, the Gate-controlled dual direction silicon controlled rectifier (GCDDSCR) and a DDSCR embedded with Schottky barrier diode (SBD-GCDDSCR) structures are designed and studied in this article as standalone devices for primary protection. The gate-controlled diodes and Schottky diodes are integrated into the simple DDSCR structure to enhance its robustness while reducing the on-resistance. The inclusion of gate diodes introduced an additional current path near the surface, improving space utilization in the longitudinal direction of the device, and the addition of Schottky junctions placed adjacent to the Anode and Cathode can provide additional electron extraction paths. Both methods contribute in a more uniform current distribution, improving the robustness of the device. Two-dimensional device simulation based on a classical set of equations was employed to investigate its electrical behavior during an ESD event. Based on the 0.18 μm CMOS process, all structures were fabricated into 6-finger devices with a finger length of 50 μm. The Transmission Line Pulse (TLP) testing method was used to evaluate their ESD characteristics, revealing that the addition of the gate-controlled diodes and Schottky shunt paths improved robustness. The proposed SBD-GCDDSCR structure demonstrated superior robustness under ESD stress, with a failure current exceeding 19 A in both forward and reverse directions, and its Vt2 in strong saturation regime is around 48 V.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.