Design of high robustness DDSCR with embedded gate-controlled diodes and Schottky diodes

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Solid-state Electronics Pub Date : 2026-01-01 Epub Date: 2025-11-02 DOI:10.1016/j.sse.2025.109283
Yitao Wang , Shuoxin Ji , Yang Wang
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引用次数: 0

Abstract

Due to the harsh working environments of Input/Output (I/O) pins, the electro-static discharge (ESD) protection devices of these ports often require high robustness. To design highly robust ESD protection devices with dual polarities, the Gate-controlled dual direction silicon controlled rectifier (GCDDSCR) and a DDSCR embedded with Schottky barrier diode (SBD-GCDDSCR) structures are designed and studied in this article as standalone devices for primary protection. The gate-controlled diodes and Schottky diodes are integrated into the simple DDSCR structure to enhance its robustness while reducing the on-resistance. The inclusion of gate diodes introduced an additional current path near the surface, improving space utilization in the longitudinal direction of the device, and the addition of Schottky junctions placed adjacent to the Anode and Cathode can provide additional electron extraction paths. Both methods contribute in a more uniform current distribution, improving the robustness of the device. Two-dimensional device simulation based on a classical set of equations was employed to investigate its electrical behavior during an ESD event. Based on the 0.18 μm CMOS process, all structures were fabricated into 6-finger devices with a finger length of 50 μm. The Transmission Line Pulse (TLP) testing method was used to evaluate their ESD characteristics, revealing that the addition of the gate-controlled diodes and Schottky shunt paths improved robustness. The proposed SBD-GCDDSCR structure demonstrated superior robustness under ESD stress, with a failure current exceeding 19 A in both forward and reverse directions, and its Vt2 in strong saturation regime is around 48 V.
嵌入式门控二极管和肖特基二极管的高鲁棒性DDSCR设计
由于输入/输出(I/O)引脚的工作环境恶劣,因此这些端口的ESD (electrostatic discharge)保护器件通常要求很高的鲁棒性。为了设计具有高鲁棒性的双极性ESD保护器件,本文设计并研究了门控双向可控硅整流器(GCDDSCR)和嵌入肖特基势垒二极管(SBD-GCDDSCR)作为独立的初级保护器件。门控二极管和肖特基二极管集成到简单的DDSCR结构中,以提高其稳健性,同时降低导通电阻。栅极二极管的包含在表面附近引入了额外的电流路径,提高了器件纵向上的空间利用率,并且在阳极和阴极附近添加的肖特基结可以提供额外的电子提取路径。这两种方法都有助于更均匀的电流分布,提高器件的稳健性。采用基于经典方程组的二维器件仿真方法研究了其在ESD事件中的电学行为。基于0.18 μm CMOS工艺,将所有结构制作成指长为50 μm的6指器件。使用传输线脉冲(TLP)测试方法评估了它们的ESD特性,结果表明,门控二极管和肖特基分流路径的加入提高了稳健性。所提出的SBD-GCDDSCR结构在ESD应力下具有优异的鲁棒性,正反方向失效电流均超过19 a,强饱和状态下的Vt2约为48 V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
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