Crystallographic texture evolution in NbN thin films produced by reactive magnetron sputtering

Abstract

The crystallographic texture plays an important role in the performance of niobium nitride thin films, in superconducting devices, or as a coating for improved corrosion resistance. Here, we investigate the texture evolution with thickness and substrate temperature during deposition. Thin films were produced using reactive magnetron sputtering onto substrates held at 573, 673 or 773 K. Cubic and hexagonal crystallographic phases were observed in a columnar morphology. Texture evolves from cubic (111), below a critical thickness of $\approx 300\mathrm{nm}$, to cubic (200) in thicker films; hexagonal (100) phase is also observed in thicker films grown at 773 K.