Co dopant enhance the thermoelectric properties of Cu2Se films via magnetism and smooth surface

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Linlin Liu, Jingna Zhang, Xinyu Bai, Shiying Liu
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引用次数: 0

Abstract

Cu2Se has a liquid-like structure and is a promising thermoelectric material. However, the defects in Cu2Se thin films are difficult to control, which limits the improvement of the thermoelectric performance of the films. Co doping inhibits the thermally-induced phase transition of Cu2Se thin films and enhances the thermoelectric performance by leveraging the interaction between the magnetism of Co and the film carriers. Changes in the Co content will influence the surface morphology by regulating the phase composition. Moreover, a relatively dense-surfaced Cu2Se thin film can be obtained through Co doping. When the doping amount is 0.98 %, Co atoms exist in the form of a small number of interstitial defects, Coi. When the doping amount increases to 2.38 %, a large number of Coi are filled into the sub-lattice of the β-phase. This inhibits the formation of the α-phase and leads to the formation of a stable sub-lattice structure. As a result, it increases the hopping activation energy of carriers, enhances lattice coupling, and promotes acoustic phonon scattering. The magnetism of Co-doped Cu2Se thin films is related to the quantity of Coi. The small amount of Coi can provide impurity energy levels, reduce the hopping activation energy of carriers, and generate ionized impurity scattering. Meanwhile, a small amount of Coi gives rise to a built-in magnetic field in micro-regions, which restricts the migration of low-energy carriers in local regions. The relatively large effective mass makes the 0.98 %-Co film exhibit a relatively high Seebeck coefficient, effectively increasing the power factor of the film.
Co掺杂剂通过磁性和表面光滑度增强Cu2Se薄膜的热电性能
Cu2Se具有液体状结构,是一种很有前途的热电材料。然而,Cu2Se薄膜的缺陷难以控制,限制了薄膜热电性能的提高。Co掺杂抑制了Cu2Se薄膜的热致相变,并利用Co与薄膜载流子的磁性相互作用提高了薄膜的热电性能。Co含量的变化会通过调节相组成来影响表面形貌。此外,通过Co掺杂可以获得表面相对致密的Cu2Se薄膜。当掺杂量为0.98%时,Co原子以少量间隙缺陷Coi的形式存在。当掺杂量增加到2.38%时,大量的Coi填充到β相的亚晶格中。这抑制了α-相的形成,导致形成稳定的亚晶格结构。因此,它增加了载流子的跳变活化能,增强了晶格耦合,促进了声子散射。共掺杂Cu2Se薄膜的磁性与Coi的含量有关。少量的Coi可以提供杂质能级,降低载流子的跳变活化能,产生电离杂质散射。同时,少量的Coi会在微区域产生内建磁场,限制了局部区域低能载流子的迁移。较大的有效质量使得0.98% -Co薄膜具有较高的塞贝克系数,有效地提高了薄膜的功率因数。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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