A. Muthuganesh , S. Mohamed Rafi , E.V. Siddhardhan , S. Surender , Ramesh Kumar Raji , J.P. Soundranayagam , P. Elangovan , X. Helan Flora
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引用次数: 0
Abstract
The development of high-performance and sustainable photocatalysts is pivotal for mitigating environmental pollution, particularly in the treatment of dye-contaminated industrial wastewater. In this study, we report the synthesis of a graphitic carbon nitride/cadmium sulfide (g-CN/CdS) composite via a facile hydrothermal method, aimed at enhancing visible-light-driven photocatalytic efficiency and long-term stability. Comprehensive structural and chemical characterizations, including X-ray diffraction (XRD) and Fourier-transform infrared (FT-IR) spectroscopy, confirm the successful anchoring of CdS nanoparticles onto the g-CN matrix. Photocatalytic performance evaluations reveal that the g-CN/CdS composite exhibits a significantly higher degradation rate of Congo Red (CR) dye compared to its individual counterparts, achieving an exceptional degradation efficiency of 99.85 % under visible-light irradiation. The superior activity is primarily attributed to the synergistic coupling between g-CN and CdS, which facilitates efficient charge carrier separation, suppresses electron–hole recombination, and mitigates photocorrosion. This work underscores the importance of heterojunction engineering in optimizing photocatalytic materials and offers a viable pathway for designing next-generation nanocomposites for eco-friendly and scalable wastewater remediation technologies.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.