Self-rectifying resistive switching behavior and analog characteristics in the Bi0.95Er0.05FeO3/ZnFe2O4 heterostructures

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Wenlong Liu , Chuangqi Zhang , Di Li , Jin Zong , Jiahua Wei , Guoqiang Tan , Qibin Yuan , Ao Xia , Fulai Qi , Xu Xue
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Abstract

The development of Resistive Random Access Memory (RRAM) devices is expected to drive a revolutionary change in artificial intelligence, especially playing a key role in neuromorphic computing applications. Novel RRAM devices with self-rectifying and analog characteristics have become a research hotspot in current research areas due to their unique electrical characteristics. Here, a remarkable bipolar resistive switching (RS) behavior with the self-rectifying effects and analog characteristics is observed in the (16-x)Bi0.95Er0.05FeO3/(x)ZnFe2O4 (BEFO/ZFO; x = 1, 3, 5, 7) heterostructures, which are prepared on FTO substrates using the sol-gel method. The optimal RS behavior is obtained for the x = 3 sample, including endurance over 1000 operations and stable retention up to 5000 s. The conductive mechanisms of the x = 3 devices at high resistance state (HRS) complies with the Space Charge Limited Current (SCLC) model. In contrast, the low resistance state (LRS) is dominated by the Schottky model. The RS behavior is correlated with the changes in the depletion layer width and barrier height at the p-n junction interface. Moreover, the conductivity of the x = 3 sample increases with successive sweeps of the applied voltage, showing favorable analog characteristics, suggesting the (16-x)BEFO/(x)ZFO heterostructures with the self-rectifying effect offer promising prospects for the RRAM devices in realizing neuromorphic applications.
Bi0.95Er0.05FeO3/ZnFe2O4异质结构的自整流电阻开关行为和模拟特性
电阻式随机存取存储器(RRAM)器件的发展有望推动人工智能的革命性变化,特别是在神经形态计算应用中发挥关键作用。具有自整流和模拟特性的新型RRAM器件因其独特的电学特性而成为当前研究领域的研究热点。本文采用溶胶-凝胶法在FTO衬底上制备(16-x)Bi0.95Er0.05FeO3/(x)ZnFe2O4 (BEFO/ZFO; x = 1,3,5,7)异质结构,观察到具有自整流效应和模拟特性的显著双极电阻开关(RS)行为。对于x = 3的样品,获得了最佳的RS行为,包括超过1000次操作的耐久性和高达5000秒的稳定保留。x = 3器件在高阻状态(HRS)的导电机理符合空间电荷限流(SCLC)模型。相反,低阻态(LRS)由肖特基模型主导。RS行为与p-n结界面损耗层宽度和势垒高度的变化有关。此外,随着施加电压的连续扫频,x = 3样品的电导率增加,表现出良好的模拟特性,表明具有自整流效应的(16-x)BEFO/(x)ZFO异质结构在RRAM器件实现神经形态应用方面具有良好的前景。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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