{"title":"Investigation of Emission Characteristics of Dielectric Barrier Discharge-Based Kr/Cl2 Excilamp at Different Operating Conditions","authors":"Navin Kumar Sharma, Priti Pal, Akhilesh Mishra, Mahendra Singh, Ram Prakash Lamba, Subhash Kumar Ram, Udit Narayan Pal","doi":"10.1007/s11090-025-10579-8","DOIUrl":null,"url":null,"abstract":"<div><p>A coaxial dielectric barrier discharges based Kr/Cl<sub>2</sub> excilamp featuring a double dielectric barrier has been developed to generate 222 nm Far UV-C radiation. The excilamp is excited by a short unipolar pulse (rise time 800 ns, FWHM: ~2µs) of negative polarity and investigated at different operating conditions to efficiently generate 222 nm radiation. The investigation includes the electrical and optical characterisation of the excilamp under varying Cl<sub>2</sub> proportion (0.1-3%) and total gas pressures (100–300 mbar). The typical V-I characteristics and the corresponding Q-V curve have been analysed to understand the discharge characteristics and determine the electrical parameters, including the capacitance of the excilamp and input power. The optical characterization included emission spectroscopy and absolute radiance measurements, focusing on the 222 nm spectral band, a key emission wavelength of KrCl* excimers. The emission spectra reveal the emission of the 222 nm spectral band, along with relatively weak bands of 235 nm, 258 nm, and 325 nm, particularly at higher pressures. The absolute irradiance at 222 nm was found to increase with Cl₂ concentration up to 1%, reaching a peak value of 2.09 mW/cm² (at 300 mbar) before significantly decreasing at 3%, indicating an optimal Cl₂ content for KrCl<sup>*</sup> excimer formation. Similarly, increasing the total gas pressure from 100 mbar to 400 mbar led to a substantial enhancement in 222 nm emission, with irradiance rising from 0.47 mW/cm² to 2.35 mW/cm². This comprehensive analysis provides crucial insights into the development and optimization of Kr/Cl₂ excimer lamps for efficient 222 nm far-ultraviolet (Far-UV) radiation generation.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"45 5","pages":"1465 - 1480"},"PeriodicalIF":2.5000,"publicationDate":"2025-06-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Chemistry and Plasma Processing","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s11090-025-10579-8","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
引用次数: 0
Abstract
A coaxial dielectric barrier discharges based Kr/Cl2 excilamp featuring a double dielectric barrier has been developed to generate 222 nm Far UV-C radiation. The excilamp is excited by a short unipolar pulse (rise time 800 ns, FWHM: ~2µs) of negative polarity and investigated at different operating conditions to efficiently generate 222 nm radiation. The investigation includes the electrical and optical characterisation of the excilamp under varying Cl2 proportion (0.1-3%) and total gas pressures (100–300 mbar). The typical V-I characteristics and the corresponding Q-V curve have been analysed to understand the discharge characteristics and determine the electrical parameters, including the capacitance of the excilamp and input power. The optical characterization included emission spectroscopy and absolute radiance measurements, focusing on the 222 nm spectral band, a key emission wavelength of KrCl* excimers. The emission spectra reveal the emission of the 222 nm spectral band, along with relatively weak bands of 235 nm, 258 nm, and 325 nm, particularly at higher pressures. The absolute irradiance at 222 nm was found to increase with Cl₂ concentration up to 1%, reaching a peak value of 2.09 mW/cm² (at 300 mbar) before significantly decreasing at 3%, indicating an optimal Cl₂ content for KrCl* excimer formation. Similarly, increasing the total gas pressure from 100 mbar to 400 mbar led to a substantial enhancement in 222 nm emission, with irradiance rising from 0.47 mW/cm² to 2.35 mW/cm². This comprehensive analysis provides crucial insights into the development and optimization of Kr/Cl₂ excimer lamps for efficient 222 nm far-ultraviolet (Far-UV) radiation generation.
期刊介绍:
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.