Investigation of Emission Characteristics of Dielectric Barrier Discharge-Based Kr/Cl2 Excilamp at Different Operating Conditions

IF 2.5 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Navin Kumar Sharma, Priti Pal, Akhilesh Mishra, Mahendra Singh, Ram Prakash Lamba, Subhash Kumar Ram, Udit Narayan Pal
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Abstract

A coaxial dielectric barrier discharges based Kr/Cl2 excilamp featuring a double dielectric barrier has been developed to generate 222 nm Far UV-C radiation. The excilamp is excited by a short unipolar pulse (rise time 800 ns, FWHM: ~2µs) of negative polarity and investigated at different operating conditions to efficiently generate 222 nm radiation. The investigation includes the electrical and optical characterisation of the excilamp under varying Cl2 proportion (0.1-3%) and total gas pressures (100–300 mbar). The typical V-I characteristics and the corresponding Q-V curve have been analysed to understand the discharge characteristics and determine the electrical parameters, including the capacitance of the excilamp and input power. The optical characterization included emission spectroscopy and absolute radiance measurements, focusing on the 222 nm spectral band, a key emission wavelength of KrCl* excimers. The emission spectra reveal the emission of the 222 nm spectral band, along with relatively weak bands of 235 nm, 258 nm, and 325 nm, particularly at higher pressures. The absolute irradiance at 222 nm was found to increase with Cl₂ concentration up to 1%, reaching a peak value of 2.09 mW/cm² (at 300 mbar) before significantly decreasing at 3%, indicating an optimal Cl₂ content for KrCl* excimer formation. Similarly, increasing the total gas pressure from 100 mbar to 400 mbar led to a substantial enhancement in 222 nm emission, with irradiance rising from 0.47 mW/cm² to 2.35 mW/cm². This comprehensive analysis provides crucial insights into the development and optimization of Kr/Cl₂ excimer lamps for efficient 222 nm far-ultraviolet (Far-UV) radiation generation.

基于介质阻挡放电的Kr/Cl2激光放大器在不同工作条件下的发射特性研究
研制了一种具有双介质阻挡层的同轴介质阻挡放电氪/Cl2激光放大器,可产生222 nm远紫外- c辐射。利用负极性短单极脉冲(上升时间为800 ns,频宽为~2µs)激发激振放大器,研究了激振放大器在不同工作条件下产生222 nm辐射的效率。研究包括在不同Cl2比例(0.1-3%)和总气体压力(100-300毫巴)下excilamp的电学和光学特性。分析了典型的V-I特性和相应的Q-V曲线,了解了放电特性,确定了电参数,包括激光放大器的电容和输入功率。光学表征包括发射光谱和绝对辐亮度测量,重点研究了KrCl*准分子的关键发射波长222 nm波段。发射光谱显示了222 nm波段的发射,以及相对较弱的235 nm、258 nm和325 nm波段,特别是在高压下。在222nm处,当Cl₂浓度达到1%时,绝对辐照度增加,峰值为2.09 mW/cm²(300 mbar),但在3%时显著下降,表明形成KrCl*准分子的最佳Cl₂含量。同样,将总气体压力从100毫巴增加到400毫巴,导致222 nm发射的显著增强,辐照度从0.47 mW/cm²增加到2.35 mW/cm²。这一综合分析为开发和优化高效222nm远紫外(Far-UV)辐射的Kr/Cl₂准分子灯提供了重要的见解。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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