Formation of Heterostructured Silicon Thick Films in Atmospheric-Pressure Very High-Frequency Plasma for Possible Application to Lithium Ion Battery Anode

IF 2.5 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2025-05-29 DOI:10.1007/s11090-025-10573-0

Afif Hamzens, Shota Mochizuki, Farrel Dzaudan Naufal, Koki Hiromoto, Hiromasa Ohmi, Hiroaki Kakiuchi

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Abstract

The superiority of silicon (Si) film performance as anode material in the rechargeable battery technologies is tormented by the huge volume expansion during cycle. The combined structure of a microcrystalline Si with high porous/defect density and an isotropic amorphous Si has been proposed as a feasible solution. Our own deposition process using atmospheric-pressure (AP) plasma excited by very high-frequency (VHF) power has managed to create a non-composite Si film with gradient phase along thickness direction. It is highly indicated that a slower gas flow rate and/or a larger power input cause the nanoparticle formation in the AP-VHF plasma to occur more actively, which significantly influenced the development of a crystalline layer with a high density of grain boundaries. A good film reproducibility on Cu substrate imply an interesting possibility of heterostructured Si application for LIBs anode.

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常压甚高频等离子体中异质结构硅厚膜的形成及其在锂离子电池负极中的应用

在可充电电池技术中，硅（Si）薄膜作为负极材料的优越性能受到循环过程中巨大体积膨胀的困扰。高孔/缺陷密度的微晶硅与各向同性非晶硅的组合结构是一种可行的解决方案。我们利用甚高频（VHF）功率激发的常压（AP）等离子体沉积工艺，成功地制备了一种沿厚度方向具有梯度相位的非复合硅膜。研究结果表明，较慢的气体流速和/或较大的功率输入会使AP-VHF等离子体中纳米颗粒的形成更加活跃，从而显著影响具有高密度晶界的晶体层的发育。Cu衬底上良好的薄膜再现性意味着异质结构Si应用于锂离子电池阳极的可能性很大。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.