Numerical Study of the Propagation Characteristics of He + Ar + O2 Atmospheric Pressure Plasma Jet

IF 2.5 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2025-05-28 DOI:10.1007/s11090-025-10574-z

Tongtong He, Ningyuan Zhou, Yuesheng Zheng

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Abstract

A two-dimensional axisymmetric fluid model was employed to investigate the influence of varying argon volume fraction in the working gas on the propagation characteristics and reactive species generation of pulsed He + Ar + O₂ plasma jet. The results demonstrate that at an argon volume fraction of 10%, the Penning effect between He and Ar is most pronounced, and the electron temperature and electron density of the He + Ar + O₂ plasma jet reach their maxima. The electron temperature in the upstream region of the jet front dissipates more slowly due to Penning ionization between helium and argon. At the end of the pulse, higher—temperature electrons accumulate near the tube nozzle in a triangular distribution. During propagation from the tube into open air, the ionization wave of the He + Ar + O₂ plasma jet evolves from a hollow ring to a solid bullet shape, with the highest bullet velocity observed at an argon volume fraction of 10%. The densities of Ar⁺ and Ar^* reach their maxima at argon volume fractions of 10% and 30%, respectively, while the densities of He⁺ and He^* decrease monotonically as the argon volume fraction increases. Notably, the ozone generation efficiency is maximized at an argon volume fraction of 10%.

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He + Ar + O2大气压等离子体射流传输特性的数值研究

采用二维轴对称流体模型研究了不同氩气体积分数对脉冲He + Ar + O2等离子体射流传播特性和反应物质生成的影响。结果表明：当氩气体积分数为10%时，He和Ar之间的Penning效应最为明显，He + Ar + O2等离子体射流的电子温度和电子密度达到最大值；由于氦和氩之间的潘宁电离作用，射流锋面上游区域的电子温度耗散较慢。在脉冲结束时，高温电子以三角形分布聚集在管喷嘴附近。He + Ar + O2等离子体射流的离子波在从管道传播到空气中的过程中，由空心环演变成实心子弹形状，在氩气体积分数为10%时达到了最高的子弹速度。当氩气体积分数为10%和30%时，Ar+和Ar*的密度达到最大值，而He+和He*的密度随着氩气体积分数的增加而单调降低。值得注意的是，当氩气体积分数为10%时，臭氧生成效率最高。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.