A SDBD Reactor for the Removal of Oxygen Traces in Hydrogen Operated above Atmospheric Pressure: Experiment and Simulation

IF 2.5 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Christian Oberste-Beulmann, Philipp Wirth, Soad Mohsenimehr, Timothy Oppotsch, Achim von Keudell, Peter Awakowicz, Martin Muhler
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引用次数: 0

Abstract

Non-thermal plasma-based technologies have emerged as versatile tools for various industrial processes due to their ability to induce chemical reactions efficiently under ambient conditions. In particular, dielectric barrier discharges (DBDs) are of interest because of their robust and reliable design and scalability. This study investigates the role of pressure in tuning conversion, plasma parameters, and flow patterns in a plasma-assisted chemical reaction using a surface DBD (SDBD) reactor. The removal of O2 traces in H2 was used as a model reaction, where an unexpected increased conversion at elevated pressure was observed at high powers. This effect was studied using high-speed photography to analyze streamer dynamics and optical emission spectroscopy to determine plasma parameters. With increasing pressure, both the plasma area and the number of individual streamers decreased, and the electron density decreased as well. Fluid simulations were conducted to examine the impact of increased pressure on mass transport pointing to an enhanced contact time as the origin of the increased conversion at high dissipated powers. The findings highlight the importance of optimizing pressure and power conditions to maximize the efficiency of plasma-based chemical processes.

常压以上运行的SDBD反应器脱除氢中的痕量氧:实验与模拟
基于非热等离子体的技术已经成为各种工业过程的通用工具,因为它们能够在环境条件下有效地诱导化学反应。介质阻挡放电(DBDs)因其鲁棒可靠的设计和可扩展性而备受关注。本研究利用表面DBD (SDBD)反应器研究了压力在等离子体辅助化学反应中调谐转换、等离子体参数和流动模式中的作用。去除H2中的O2痕迹被用作模型反应,其中在高压下观察到高功率下意想不到的转化率增加。利用高速摄影技术分析流光动力学和光学发射光谱技术确定等离子体参数,研究了这种效应。随着压力的增加,等离子体面积和单个飘带的数量都减小,电子密度也减小。进行了流体模拟,以检查压力增加对质量传递的影响,指出接触时间的增加是高耗散功率下转换增加的原因。研究结果强调了优化压力和功率条件以最大化等离子体化学过程效率的重要性。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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