A systematic study on the influence of microtopography of aluminum alloy substrates on the formation kinetics and corrosion resistance of V/Zr-based conversion coatings

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-09-24 DOI:10.1016/j.tsf.2025.140803

Jianzhong Li , Mingshi Li , Zhichun Cui , Peidong Li

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Abstract

The influence of aluminum alloy microtopography on the electrochemical activity, formation kinetics and corrosion resistance of V/Zr-based conversion coating (V/ZrCC) was investigated using electrochemical methods. The results indicate that the differences in surface roughness (R_a) and average peak-to-valley depth (R_z) of aluminum alloy substrates lead to differences in the electrochemical activity, coating formation kinetics, and corrosion resistance performance of V/ZrCC. The high R_a value increases the surface area and the active site, thereby the aluminum alloy substrate exhibiting high electrochemical activity. The aluminum alloy has the highest electrochemical activity when the R_a value is 0.52 μm. The R_z value has a significant effect on the formation kinetics and corrosion resistance of V/ZrCC, Optimal corrosion resistance (Charge Transfer Resistance (Rct) = 19.88 kΩ·cm²) occurs at R_z = 4.29 μm, while R_z > 5.22 μm causes 34 % lower Rct due to incomplete coverage.

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铝合金基体微形貌对V/ zr基转化涂层形成动力学和耐蚀性影响的系统研究

采用电化学方法研究了铝合金微形貌对V/ zr基转化涂层（V/ZrCC）电化学活性、形成动力学和耐蚀性的影响。结果表明，铝合金基体表面粗糙度（Ra）和平均峰谷深度（Rz）的差异导致了V/ZrCC的电化学活性、镀层形成动力学和耐腐蚀性能的差异。高Ra值增加了铝合金基体的表面积和活性位点，从而使铝合金基体表现出较高的电化学活性。Ra值为0.52 μm时，铝合金的电化学活性最高。Rz值对V/ZrCC的形成动力学和耐蚀性有显著影响，在Rz = 4.29 μm时出现最佳耐蚀性（电荷传递电阻Rct = 19.88 kΩ·cm²），而Rz >； 5.22 μm由于覆盖不完全，Rct降低34%。

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.