A polarization-independent two-dimensional grating with strong process robustness and high diffraction efficiency

IF 5 2区 物理与天体物理 Q1 OPTICS
Ruipeng Wang , Zhendong Chi , Guojun Yang , Jiale Zuo , Wenhao Li , Zhongming Zheng , Yanxiu Jiang
{"title":"A polarization-independent two-dimensional grating with strong process robustness and high diffraction efficiency","authors":"Ruipeng Wang ,&nbsp;Zhendong Chi ,&nbsp;Guojun Yang ,&nbsp;Jiale Zuo ,&nbsp;Wenhao Li ,&nbsp;Zhongming Zheng ,&nbsp;Yanxiu Jiang","doi":"10.1016/j.optlastec.2025.113966","DOIUrl":null,"url":null,"abstract":"<div><div>To maintain groove profile consistency across large 2D gratings, this paper proposes a gold-based polarization-independent 2D grating that combines high process tolerance and excellent diffraction efficiency, thus enabling efficient fabrication of 2D gratings. By establishing a comprehensive perturbation model incorporating morphological errors, we analyze the coupling effects of material and geometric parameters on the (−1,0)-order diffraction efficiency of metallic 2D gratings for 780 nm transverse electric (TE) or transverse magnetic (TM) polarized light under Littrow incidence. Analysis results indicate that within tolerances of ±35 nm for groove depth, ±0.1 for duty cycle, and ±15° for sidewall angle, the dual-polarization diffraction efficiency remains above 60 %, with theoretical maximum efficiencies reaching 94.67 % for TE polarization and 92.96 % for TM polarization. Measurements on fabricated gold-coated 2D gratings using dual-beam interference lithography show that dual-polarization efficiencies consistently exceed 70 % when the duty cycle is adjusted with sidewall angle variations within ±15°. The optimal sample achieves 84.15 % TE efficiency and 84.32 % TM efficiency with a polarization imbalance of only 0.1 %, demonstrating excellent agreement between experimental results and theoretical predictions. The robust design presented here establishes an important theoretical foundation for fabricating large 2D gratings with high diffraction efficiency.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"192 ","pages":"Article 113966"},"PeriodicalIF":5.0000,"publicationDate":"2025-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0030399225015579","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0

Abstract

To maintain groove profile consistency across large 2D gratings, this paper proposes a gold-based polarization-independent 2D grating that combines high process tolerance and excellent diffraction efficiency, thus enabling efficient fabrication of 2D gratings. By establishing a comprehensive perturbation model incorporating morphological errors, we analyze the coupling effects of material and geometric parameters on the (−1,0)-order diffraction efficiency of metallic 2D gratings for 780 nm transverse electric (TE) or transverse magnetic (TM) polarized light under Littrow incidence. Analysis results indicate that within tolerances of ±35 nm for groove depth, ±0.1 for duty cycle, and ±15° for sidewall angle, the dual-polarization diffraction efficiency remains above 60 %, with theoretical maximum efficiencies reaching 94.67 % for TE polarization and 92.96 % for TM polarization. Measurements on fabricated gold-coated 2D gratings using dual-beam interference lithography show that dual-polarization efficiencies consistently exceed 70 % when the duty cycle is adjusted with sidewall angle variations within ±15°. The optimal sample achieves 84.15 % TE efficiency and 84.32 % TM efficiency with a polarization imbalance of only 0.1 %, demonstrating excellent agreement between experimental results and theoretical predictions. The robust design presented here establishes an important theoretical foundation for fabricating large 2D gratings with high diffraction efficiency.
一种具有强工艺鲁棒性和高衍射效率的偏振无关二维光栅
为了在大型二维光栅上保持凹槽轮廓的一致性,本文提出了一种结合高工艺公差和优异衍射效率的金基偏振无关二维光栅,从而实现了二维光栅的高效制造。通过建立包含形貌误差的综合微扰模型,分析了材料和几何参数对780 nm横电(TE)或横磁(TM)偏振光金属二维光栅(- 1,0)级衍射效率的耦合效应。分析结果表明,在槽深±35 nm、占空比±0.1、侧壁角±15°的公差范围内,双偏振衍射效率保持在60%以上,其中TE偏振的理论最大效率达到94.67%,TM偏振的理论最大效率达到92.96%。利用双光束干涉光刻技术对制备的金涂层二维光栅进行测量,结果表明,当占空比随侧壁角变化在±15°范围内调整时,双偏振效率始终超过70%。最优样品的TE效率和TM效率分别达到84.15%和84.32%,极化不平衡仅为0.1%,实验结果与理论预测非常吻合。本文提出的稳健设计为制作具有高衍射效率的大型二维光栅奠定了重要的理论基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信