High Curie-temperature ferromagnetism engineering in WTe2 monolayer: The case of Mn and Fe codoping with nonmetal-enhanced magnetic properties

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
D.M. Hoat , R. Ponce-Pérez , J. Guerrero-Sanchez
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引用次数: 0

Abstract

Searching for new two-dimensional (2D) ferromagnetic materials with high Curie temperature has attracted great research attention because of the rapid development of spintronics. In this work, efficient routes for the ferromagnetism engineering in WTe2 monolayer are proposed. Pristine WTe2 monolayer is intrinsically nonmagnetic, possessing a direct band gap of 1.07 eV. The monolayer is magnetized by separately doping with Mn and Fe transition metals with total magnetic moments of 1.00 and 0.94 μB, respectively. Mn doping leads to the in-plane magnetic anisotropy (IMA), while the perpendicular magnetic anisotropy (PMA) is obtained by Fe doping. The ferromagnetic (FM) state is predicted to be stable in WTe2 monolayer codoped with Mn and Fe atoms with a high Curie temperature of 644 K. In this case, the PMA with feature-rich magnetic semiconductor nature is found, which suggest the promise of MnFe-codoped system toward fabrication of magnetoresistive random access memories (MRAMs). Further, additional substitutional doping of nonmetal (NM = S, Se, Cl, and Br) atoms is proposed to alter the magnetic properties. It is found that S and Se impurities increase Curie temperature to very high values of 1261 and 743 K, respectively. Meanwhile, this parameter decreases to 522 and 496 K by Cl and Br dopant atoms, respectively. Herein, all NM impurities induce the PMA-to-IMA switching, where the IMA is stronger with halogen impurities. Such that MnFe+NM-codoped systems can be considered as 2D potential candidates for magnetic field sensing. Moreover, NM impurities also enhance the magnetic nature semiconductor by increasing the spin-up energy gap. Finally, the stability analysis suggests the feasible experimental realization and structural stability of all the doped/codoped WTe2 systems. Our findings may recommend efficient routes to functionalize WTe2 monolayer toward selective spintronic applications controlled by nonmetal atoms.
WTe2单层的高居里温度铁磁工程:Mn和Fe共掺杂与非金属增强磁性能的情况
由于自旋电子学的迅速发展,寻找具有高居里温度的新型二维铁磁材料引起了人们的极大关注。本文提出了WTe2单层铁磁性工程的有效途径。原始的WTe2单层本质上是非磁性的,具有1.07 eV的直接带隙。单层膜分别掺杂Mn和Fe过渡金属,总磁矩分别为1.00和0.94 μB。Mn掺杂产生平面内磁各向异性(IMA), Fe掺杂产生垂直磁各向异性(PMA)。在644 K的高居里温度下,预测了Mn和Fe原子共掺杂的WTe2单层的铁磁态是稳定的。在这种情况下,发现了具有丰富磁性半导体特性的PMA,这表明了mnfe共掺杂系统在制造磁阻随机存取存储器(mram)方面的前景。此外,还提出了非金属(NM = S, Se, Cl和Br)原子的替代掺杂来改变磁性能。发现S和Se杂质使居里温度分别升高到1261 K和743 K。同时,掺杂Cl和Br原子后,该参数分别降至522 K和496 K。在这里,所有纳米杂质都诱导了pma到IMA的开关,其中卤素杂质的IMA更强。因此,MnFe+ nm共掺杂体系可以被认为是二维磁场传感的潜在候选者。此外,纳米杂质还通过增加自旋能隙来增强半导体的磁性。最后,稳定性分析提出了所有掺杂/共掺杂WTe2体系的可行实验实现和结构稳定性。我们的研究结果可能为WTe2单层功能化提供有效的途径,使其在非金属原子控制下具有选择性自旋电子应用。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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