Changhyeon Han, Been Kwak, Joonhyeok Choi, Sung-Wook Park, Dahye Yu, Minsuk Song, Rino Choi, Daewoong Kwon
{"title":"Synergistic Modulation of Polarization and Leakage Current in MPB-HZO Capacitors via TiO2 Interlayer","authors":"Changhyeon Han, Been Kwak, Joonhyeok Choi, Sung-Wook Park, Dahye Yu, Minsuk Song, Rino Choi, Daewoong Kwon","doi":"10.1002/aelm.202500314","DOIUrl":null,"url":null,"abstract":"To address critical reliability concerns in ferroelectric devices, the role of a TiO<sub>2</sub> interlayer in modulating the electrical characteristics of Hf<sub>x</sub>Zr<sub>1-x</sub>O<sub>2</sub> (HZO)-based metal-ferroelectric-metal (MFM) capacitors near the morphotropic phase boundary (MPB) is investigated. The TiO<sub>2</sub> interlayer is inserted at the HZO interface to selectively modulate defect behavior while preserving the desired MPB phase composition. Electrical, structural, and spectroscopic analyses reveal that TiO<sub>2</sub> integration enables 1) suppression of leakage pathways, 2) stabilization of polarization with enhanced dielectric response, 3) modulation of oxygen vacancy (V<sub>O</sub>) distribution, and 4) reduction of low-frequency noise (LFN) amplitude. These synergistic effects collectively improve the reliability and energy efficiency of MPB-HZO capacitors, offering a promising interface-engineering strategy for next-generation ferroelectric DRAM technologies.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"196 1","pages":""},"PeriodicalIF":5.3000,"publicationDate":"2025-09-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/aelm.202500314","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
To address critical reliability concerns in ferroelectric devices, the role of a TiO2 interlayer in modulating the electrical characteristics of HfxZr1-xO2 (HZO)-based metal-ferroelectric-metal (MFM) capacitors near the morphotropic phase boundary (MPB) is investigated. The TiO2 interlayer is inserted at the HZO interface to selectively modulate defect behavior while preserving the desired MPB phase composition. Electrical, structural, and spectroscopic analyses reveal that TiO2 integration enables 1) suppression of leakage pathways, 2) stabilization of polarization with enhanced dielectric response, 3) modulation of oxygen vacancy (VO) distribution, and 4) reduction of low-frequency noise (LFN) amplitude. These synergistic effects collectively improve the reliability and energy efficiency of MPB-HZO capacitors, offering a promising interface-engineering strategy for next-generation ferroelectric DRAM technologies.
期刊介绍:
Advanced Electronic Materials is an interdisciplinary forum for peer-reviewed, high-quality, high-impact research in the fields of materials science, physics, and engineering of electronic and magnetic materials. It includes research on physics and physical properties of electronic and magnetic materials, spintronics, electronics, device physics and engineering, micro- and nano-electromechanical systems, and organic electronics, in addition to fundamental research.