Study on drain bias dependence of Y-parameters under on-state condition in GaN HEMTs using low-frequency vector network analyzer and device simulation

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Toshiyuki Oishi , Ken Kudara , Yutaro Yamaguchi , Shintaro Shinjo , Koji Yamanaka , Saga University , Mitsubishi Electric Corporation
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引用次数: 0

Abstract

The drain bias dependence of low-frequency Y-parameters under on-state conditions in Gallium Nitride high electron mobility transistors (GaN HEMTs) is investigated using experimental results and device simulation. The Y-parameters for broadband frequencies from 10 Hz to 100 MHz were systematically measured using a vector network analyzer for drain voltage from 3 to 30 V at the gate voltage of 0 V from room temperature to 120 degrees Celsius. Six signals with the peaks were observed in the imaginary parts (Im) of Y22 and Y21. These peaks were categorized into two groups. One is that the peaks appeared around 5 MHz and have negative slopes in Arrhenius plots. Another is that the peaks appeared below 150 kHz and have an activation energy that can be estimated from Arrhenius plots. The second group was further divided into peaks appeared in both Im(Y22) and Im(Y21), and those that appeared only in Im(Y21). The device simulation including self-heating effects was performed using the trap parameters estimated from the experimental results. Both DC and Y-parameter characteristics for the simulation have good agreement with the experimental results. By the simulation for the individual effects, the peaks around 5 MHz result from the heat generation in GaN HEMTs. The peaks below 150 kHz are considered to originate from the traps in AlGaN and GaN layers. The traps in the GaN layer generate the peaks in both Im(Y22) and Im(Y21), while the traps in the AlGaN layer generate peaks in only Im(Y21).
基于低频矢量网络分析仪和器件仿真的GaN hemt导通条件下y参数漏极偏置依赖性研究
利用实验结果和器件仿真研究了氮化镓高电子迁移率晶体管(GaN HEMTs)中低频y参数在通态条件下的漏极偏置依赖性。利用矢量网络分析仪系统测量了宽带频率为10 Hz至100 MHz,栅极电压为0 V,漏极电压为3至30 V,室温至120摄氏度范围内的y参数。在Y22和Y21的虚部(Im)观察到6个有峰的信号。这些峰被分为两组。一是在阿累尼乌斯图中,峰出现在5mhz左右,呈负斜率。另一个是峰出现在150khz以下,其活化能可以由Arrhenius图估计。第二组进一步分为同时出现在Im(Y22)和Im(Y21)的峰,以及只出现在Im(Y21)的峰。利用实验结果估计的阱参数,进行了包含自热效应的器件仿真。仿真得到的直流和y参数特性与实验结果吻合较好。通过对单个效应的模拟,5mhz左右的峰值是由GaN hemt中的发热产生的。150 kHz以下的峰被认为是来自于AlGaN和GaN层中的陷阱。GaN层中的陷阱在Im(Y22)和Im(Y21)中都产生峰,而AlGaN层中的陷阱只在Im(Y21)中产生峰。
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来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
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