Open Model Interface Assisted NBTI-Aware Design With Dual-Vth Logic Synthesis Strategy for Reliability Improvement

IF 2.3 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Wangyong Chen;Ling Xiong;Mingyue Zheng;Songxuan He;Linlin Cai
{"title":"Open Model Interface Assisted NBTI-Aware Design With Dual-Vth Logic Synthesis Strategy for Reliability Improvement","authors":"Wangyong Chen;Ling Xiong;Mingyue Zheng;Songxuan He;Linlin Cai","doi":"10.1109/TDMR.2025.3572299","DOIUrl":null,"url":null,"abstract":"As CMOS technology scales down into the nanometer regime, the NBTI effect becomes a major issue for circuit reliability. This paper proposes an NBTI-aware design method with dual-Vth logic synthesis strategy for reliability improvement. NBTI awareness is innovatively incorporated into EDA toolchains based on NBTI-aware standard cell library and Open Model Interface (OMI), which considers aging difference among transistors instead of constant worst-case degradation. Furthermore, the circuit timing for post-aging delay is optimized by realizing the dual-Vth synthesis. The results show that in the original design without the optimal design strategy, the NBTI effect leads to obvious timing degradation. In contrast, when using the proposed OMI assisted design approach, timing degradation caused by NBTI can be suppressed effectively, allowing the circuit to continue operating normally even after aging.","PeriodicalId":448,"journal":{"name":"IEEE Transactions on Device and Materials Reliability","volume":"25 3","pages":"528-534"},"PeriodicalIF":2.3000,"publicationDate":"2025-03-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Device and Materials Reliability","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11008587/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
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Abstract

As CMOS technology scales down into the nanometer regime, the NBTI effect becomes a major issue for circuit reliability. This paper proposes an NBTI-aware design method with dual-Vth logic synthesis strategy for reliability improvement. NBTI awareness is innovatively incorporated into EDA toolchains based on NBTI-aware standard cell library and Open Model Interface (OMI), which considers aging difference among transistors instead of constant worst-case degradation. Furthermore, the circuit timing for post-aging delay is optimized by realizing the dual-Vth synthesis. The results show that in the original design without the optimal design strategy, the NBTI effect leads to obvious timing degradation. In contrast, when using the proposed OMI assisted design approach, timing degradation caused by NBTI can be suppressed effectively, allowing the circuit to continue operating normally even after aging.
基于双vth逻辑综合策略的开放接口辅助nbti感知设计提高可靠性
随着CMOS技术缩小到纳米级,NBTI效应成为电路可靠性的一个主要问题。本文提出了一种基于双v值逻辑综合策略的nbti感知设计方法。基于NBTI感知标准单元库和开放模型接口(OMI),创新地将NBTI感知整合到EDA工具链中,考虑晶体管之间的老化差异,而不是持续的最坏情况退化。此外,通过实现双vth合成,优化了后老化延迟的电路时序。结果表明,在没有优化设计策略的原始设计中,NBTI效应会导致明显的时序退化。相反,当使用OMI辅助设计方法时,可以有效地抑制由NBTI引起的时序退化,使电路即使在老化后也能继续正常工作。
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来源期刊
IEEE Transactions on Device and Materials Reliability
IEEE Transactions on Device and Materials Reliability 工程技术-工程:电子与电气
CiteScore
4.80
自引率
5.00%
发文量
71
审稿时长
6-12 weeks
期刊介绍: The scope of the publication includes, but is not limited to Reliability of: Devices, Materials, Processes, Interfaces, Integrated Microsystems (including MEMS & Sensors), Transistors, Technology (CMOS, BiCMOS, etc.), Integrated Circuits (IC, SSI, MSI, LSI, ULSI, ELSI, etc.), Thin Film Transistor Applications. The measurement and understanding of the reliability of such entities at each phase, from the concept stage through research and development and into manufacturing scale-up, provides the overall database on the reliability of the devices, materials, processes, package and other necessities for the successful introduction of a product to market. This reliability database is the foundation for a quality product, which meets customer expectation. A product so developed has high reliability. High quality will be achieved because product weaknesses will have been found (root cause analysis) and designed out of the final product. This process of ever increasing reliability and quality will result in a superior product. In the end, reliability and quality are not one thing; but in a sense everything, which can be or has to be done to guarantee that the product successfully performs in the field under customer conditions. Our goal is to capture these advances. An additional objective is to focus cross fertilized communication in the state of the art of reliability of electronic materials and devices and provide fundamental understanding of basic phenomena that affect reliability. In addition, the publication is a forum for interdisciplinary studies on reliability. An overall goal is to provide leading edge/state of the art information, which is critically relevant to the creation of reliable products.
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