Piotr Wiśniewski , Andrzej Mazurak , Alicja Kądziela , Maciej Filipiak , Bartłomiej Stonio , Romuald B. Beck
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引用次数: 0
Abstract
In this work, we study the silicon-oxide resistive switching memory based on the hydrogen silsesquioxane (HSQ) layer. We fabricated the Al/HSQ/n++ − Si RRAM (Resistive Random Access Memory) devices and performed electrical characterization. Transport mechanisms for different voltage ranges in High Resistance State (HRS) and Low Resistance State (LRS) were identified and analyzed. We show that spin on the silicon oxide layer can result in good resistive switching properties that can be utilized in the design and fabrication of RRAM devices.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.