A Unified Optimization Model for Vertical Power High- k Superjunction With NPT and PT Modes

IF 4.5 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Haimeng Huang;Chenxing Wang;Zhentao Xiao
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引用次数: 0

Abstract

This letter introduces a simplified electric field model for high- $\boldsymbol {k}$ superjunctions (H $\boldsymbol {k}$ SJs) under the punch-through (PT) mode, and its novel modification for the non-punch-through (NPT) mode, which is further extended to incorporate interface charges ( ${Q}_{\text {it}}$ ) at the heterointerface. A unified optimization framework for PT and NPT modes is developed and compares width-based and aspect ratio (AR)-based strategies, obtaining the minimum specific ON-resistance ( ${R}_{\text {on,sp}}$ ) under the designed breakdown voltage (BV). The analytical results of ${R}_{\text {on,sp}}$ are in good agreement with MEDICI simulations and a refined ${R}_{\text {on,sp}} \propto \text { BV}^{\text {1.37}}$ is obtained under given Hk-pillar width (b) and permittivity ratio ( ${K}_{\text {r}}$ ). It aslo reveals that H $\boldsymbol {k}$ SJs with the same product of b and ${K}_{\text {r}}$ exhibit identicalon-resistance. Furthermore, a theoretical limit of ${R}_{\text {on,sp}} \propto \text { BV}^{\text {1.06}}$ and an estimated saturation threshold for dielectric benefits are identified to reduce the need for high- $\boldsymbol {k}$ materials. This work establishes a compact and generalizable framework for modeling and optimizing HkSJs, supported by simulation benchmarks and offering practical guidance for device design.
具有NPT和PT模式的垂直功率高k超结的统一优化模型
本文介绍了穿孔(PT)模式下高$\boldsymbol {k}$超结(H $\boldsymbol {k}$ SJs)的简化电场模型,以及该模型在非穿孔(NPT)模式下的新修改,该模型进一步扩展到在异质界面处包含界面电荷(${Q}_{\text {it}}$)。建立了PT和NPT模式的统一优化框架,并对基于宽度和基于长宽比(AR)的策略进行了比较,得到了设计击穿电压(BV)下最小比导通电阻(${R}_{\text {on,sp}}$)。在给定hk -柱宽度(b)和介电常数比(${K}_{\text {R}}$的情况下,${R}_{\text {R}}$的解析结果与MEDICI模拟结果吻合较好,得到了精细化的${R}_{\text {n},sp}} \propto \text {BV}^{\text{1.37}}$。结果表明,b与${k} _{\text {r}}$积相同的H $\boldsymbol {k}$ SJs具有相同的抗单性。此外,还确定了${R}_{\text {on,sp}} \propto \text {BV}^{\text{1.06}}$的理论极限和介电效益的估计饱和阈值,以减少对高$\boldsymbol {k}$材料的需求。这项工作建立了一个紧凑和通用的框架,用于建模和优化HkSJs,由模拟基准测试支持,并为设备设计提供实用指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
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