Daniel C. Shoemaker;Kelly Woo;Yiwen Song;Mohamadali Malakoutian;Bill Zivasatienraj;Puneet Srivastava;Isaac Wildeson;Srabanti Chowdhury;Sukwon Choi
{"title":"Enhanced Cooling of Multifinger GaN HEMTs via Topside Diamond Integration","authors":"Daniel C. Shoemaker;Kelly Woo;Yiwen Song;Mohamadali Malakoutian;Bill Zivasatienraj;Puneet Srivastava;Isaac Wildeson;Srabanti Chowdhury;Sukwon Choi","doi":"10.1109/LED.2025.3588202","DOIUrl":null,"url":null,"abstract":"Gallium nitride high electron mobility transistors (HEMTs) are key components for today’s 5G power amplifiers. However, device overheating requires commercial devices to operate under derated power levels. This work reports the cooling effectiveness of a top-side diamond heat spreader for a 16-finger GaN/SiC HEMT using gate resistance thermometry. A <inline-formula> <tex-math>$2~\\mu $ </tex-math></inline-formula>m thick diamond heat spreader was found to reduce the gate temperature rise by ~20% at 12 W/mm. Simulation results indicate that a diamond thickness greater than <inline-formula> <tex-math>$1.5~\\mu $ </tex-math></inline-formula>m is required to achieve a 10% reduction in the device thermal resistance (<inline-formula> <tex-math>${\\mathrm{R}}_{{\\text {Th}}}$ </tex-math></inline-formula>). To achieve a 10% reduction in the <inline-formula> <tex-math>${\\mathrm{R}}_{{\\text {Th}}}$ </tex-math></inline-formula>, the thermal conductivity of a <inline-formula> <tex-math>$2~\\mu $ </tex-math></inline-formula>m thick diamond layer needs to be greater than 450 W/m<inline-formula> <tex-math>$\\cdot $ </tex-math></inline-formula> K and the SiN protection layer should be thinner than 75 nm. The incorporation of topside diamond combined with replacing the SiC substrate with diamond was shown to reduce the <inline-formula> <tex-math>${\\mathrm{R}}_{{\\text {Th}}}$ </tex-math></inline-formula> by 42.2% compared to a standard GaN/SiC HEMT in simulation.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 9","pages":"1597-1600"},"PeriodicalIF":4.5000,"publicationDate":"2025-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11078359/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Gallium nitride high electron mobility transistors (HEMTs) are key components for today’s 5G power amplifiers. However, device overheating requires commercial devices to operate under derated power levels. This work reports the cooling effectiveness of a top-side diamond heat spreader for a 16-finger GaN/SiC HEMT using gate resistance thermometry. A $2~\mu $ m thick diamond heat spreader was found to reduce the gate temperature rise by ~20% at 12 W/mm. Simulation results indicate that a diamond thickness greater than $1.5~\mu $ m is required to achieve a 10% reduction in the device thermal resistance (${\mathrm{R}}_{{\text {Th}}}$ ). To achieve a 10% reduction in the ${\mathrm{R}}_{{\text {Th}}}$ , the thermal conductivity of a $2~\mu $ m thick diamond layer needs to be greater than 450 W/m$\cdot $ K and the SiN protection layer should be thinner than 75 nm. The incorporation of topside diamond combined with replacing the SiC substrate with diamond was shown to reduce the ${\mathrm{R}}_{{\text {Th}}}$ by 42.2% compared to a standard GaN/SiC HEMT in simulation.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.