Zeyu Chi, Corinne Sartel, Vincent Sallet, Bruno Berini, Yves Dumont, Yunlin Zheng, Leonid Chernyak, Miquel Vellvehí, Amador Pérez‐Tomás, Ekaterine Chikoidze
{"title":"p‐Type β‐Ga2O3 Homoepitaxial Films with Superior Electrical Transport Properties","authors":"Zeyu Chi, Corinne Sartel, Vincent Sallet, Bruno Berini, Yves Dumont, Yunlin Zheng, Leonid Chernyak, Miquel Vellvehí, Amador Pérez‐Tomás, Ekaterine Chikoidze","doi":"10.1002/aelm.202500190","DOIUrl":null,"url":null,"abstract":"This work reports high structural quality and exceptional electrical transport properties of homoepitaxial <jats:italic>β</jats:italic>‐Ga<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> thin films grown by Metal–Organic Chemical Vapor Deposition (MOCVD) on (010)‐ and (–201)‐oriented substrates. (010) <jats:italic>β</jats:italic>‐Ga<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> samples exhibit mobility of up to 69.4 cm<jats:sup>2</jats:sup> (V·s)<jats:sup>−1</jats:sup> and stable hole concentrations ≈2.4 × 10<jats:sup>17</jats:sup> cm<jats:sup>−3</jats:sup> from 370 to 700 K. Structural and morphological studies, including XRD, AFM, and STEM, confirm high epitaxial quality, absence of extended defects and minimal strain. (–201) <jats:italic>β‐</jats:italic>Ga<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> layer, which is simultaneously grown, exhibits typical <jats:italic>p</jats:italic>‐Ga<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> behavior with observed deep level defects. The hole mobility ranging from 26 to 36 cm<jats:sup>2</jats:sup> V<jats:sup>−1</jats:sup>·s<jats:sup>−1</jats:sup> is measured between 420 and 700 K. Comparison of (010) and (–201) orientations reveals distinct anisotropic electrical properties. The findings emphasize the free motion of holes in <jats:italic>β‐</jats:italic>Ga<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> and the critical role of crystallographic orientation.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"23 1","pages":""},"PeriodicalIF":5.3000,"publicationDate":"2025-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/aelm.202500190","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
This work reports high structural quality and exceptional electrical transport properties of homoepitaxial β‐Ga2O3 thin films grown by Metal–Organic Chemical Vapor Deposition (MOCVD) on (010)‐ and (–201)‐oriented substrates. (010) β‐Ga2O3 samples exhibit mobility of up to 69.4 cm2 (V·s)−1 and stable hole concentrations ≈2.4 × 1017 cm−3 from 370 to 700 K. Structural and morphological studies, including XRD, AFM, and STEM, confirm high epitaxial quality, absence of extended defects and minimal strain. (–201) β‐Ga2O3 layer, which is simultaneously grown, exhibits typical p‐Ga2O3 behavior with observed deep level defects. The hole mobility ranging from 26 to 36 cm2 V−1·s−1 is measured between 420 and 700 K. Comparison of (010) and (–201) orientations reveals distinct anisotropic electrical properties. The findings emphasize the free motion of holes in β‐Ga2O3 and the critical role of crystallographic orientation.
期刊介绍:
Advanced Electronic Materials is an interdisciplinary forum for peer-reviewed, high-quality, high-impact research in the fields of materials science, physics, and engineering of electronic and magnetic materials. It includes research on physics and physical properties of electronic and magnetic materials, spintronics, electronics, device physics and engineering, micro- and nano-electromechanical systems, and organic electronics, in addition to fundamental research.