A Scalable Physics-Based Compact Model for Terminal Charge, Intrinsic Capacitance and Drain Current in Nanosheet Field Effect Transistors

IF 2.4 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Aishwarya Singh;Mohit D. Ganeriwala;Radhika Joglekar;Nihar R. Mohapatra
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引用次数: 0

Abstract

This study introduces a physics-based, SPICE-compatible model for Nanosheet Field-Effect Transistors (NsFETs) that offers explicit expressions for the drain current, terminal charges, and intrinsic capacitances applicable to both p-type and n-type devices. The carrier transport is modeled using the drift-diffusion formalism, while the terminal charges are calculated using the Ward-Dutton linear charge partition scheme, ensuring charge conservation. Employing a bottom-up approach, the model effectively captures quantum mechanical confinement-induced effects with minimal reliance on empirical parameters, thus preserving the simplicity characteristic of traditional bulk MOSFET models. Short channel effects are modeled in a self-consistent way. This model has been extensively validated against both experimental data and simulations across varying device dimensions and bias conditions, demonstrating exceptional scalability across all device dimensions. The proposed model has also been implemented in Verilog-A and integrated in a commercial SPICE simulator to simulate NsFETs based circuits, underscoring the model’s practical applicability in contemporary semiconductor design.
纳米片场效应晶体管终端电荷、本征电容和漏极电流的可扩展物理模型
本研究介绍了一种基于物理的、spice兼容的纳米片场效应晶体管(nsfet)模型,该模型提供了适用于p型和n型器件的漏极电流、终端电荷和固有电容的显式表达式。载流子输运采用漂移-扩散形式建模,终端电荷采用Ward-Dutton线性电荷分配格式计算,保证了电荷守恒。采用自下而上的方法,该模型有效地捕获了量子力学约束诱导效应,对经验参数的依赖最小,从而保留了传统体MOSFET模型的简单性特征。短通道效应以自洽的方式建模。该模型已经针对不同设备尺寸和偏置条件下的实验数据和模拟进行了广泛的验证,展示了在所有设备尺寸上的卓越可扩展性。所提出的模型也已在Verilog-A中实现,并集成在商业SPICE模拟器中以模拟基于nsfet的电路,强调了该模型在当代半导体设计中的实际适用性。
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来源期刊
IEEE Journal of the Electron Devices Society
IEEE Journal of the Electron Devices Society Biochemistry, Genetics and Molecular Biology-Biotechnology
CiteScore
5.20
自引率
4.30%
发文量
124
审稿时长
9 weeks
期刊介绍: The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.
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