{"title":"Analytical Modeling for Off-State Lateral Electric Field and Breakdown Voltage of AlGaN/GaN HEMTs","authors":"Soumen Deb;Amitava DasGupta;Nandita DasGupta","doi":"10.1109/JEDS.2025.3588675","DOIUrl":null,"url":null,"abstract":"A physics based model for the off-state lateral electric field in the channel of an AlGaN/GaN High Electron Mobility Transistor (HEMT) is developed by solving 2-D Poison’s equation under the gate and considering piecewise linear approximation of the lateral electric field in the depletion region adjacent to the gate edge in drain access region. The model is used to calculate the impact ionisation factor and hence the breakdown voltage of the device. The results obtained from the model show an excellent match with simulation results obtained from Sentaurus TCAD for a wide range of design parameters of the device such as Al-mole fraction in AlGaN barrier layer, as well as gate and drain biases.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":"13 ","pages":"615-624"},"PeriodicalIF":2.4000,"publicationDate":"2025-07-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11079609","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11079609/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
A physics based model for the off-state lateral electric field in the channel of an AlGaN/GaN High Electron Mobility Transistor (HEMT) is developed by solving 2-D Poison’s equation under the gate and considering piecewise linear approximation of the lateral electric field in the depletion region adjacent to the gate edge in drain access region. The model is used to calculate the impact ionisation factor and hence the breakdown voltage of the device. The results obtained from the model show an excellent match with simulation results obtained from Sentaurus TCAD for a wide range of design parameters of the device such as Al-mole fraction in AlGaN barrier layer, as well as gate and drain biases.
期刊介绍:
The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.