Lei Zhao;Shasha Wang;Hengan Zhou;Xingyu Zhu;Kaiyuan Zhou;Zhenghui Ji;Guilin Chen;Yang Gao;Enlong Liu;Wenlong Yang;Difei Yuan;Ming Wang;Zejie Zheng;Xiaolei Yang;Shikun He
{"title":"Manufacturing-Friendly SOT-MTJ Device With High Reliability and Switching Efficiency","authors":"Lei Zhao;Shasha Wang;Hengan Zhou;Xingyu Zhu;Kaiyuan Zhou;Zhenghui Ji;Guilin Chen;Yang Gao;Enlong Liu;Wenlong Yang;Difei Yuan;Ming Wang;Zejie Zheng;Xiaolei Yang;Shikun He","doi":"10.1109/LED.2025.3581997","DOIUrl":null,"url":null,"abstract":"We propose a novel manufacturing-friendly self-aligned rounded-rectangle (SARR) spin-orbit torque magnetic tunnel junction (SOT-MTJ) device, in which the rounded-rectangle-shaped MTJ pillar and SOT channel are defined by single-step etch process. Two via-type bottom electrodes (BEs) are located at both ends beneath the MTJ pillar, with their entire top surfaces covered by the MTJ pillar. This device architecture eliminates the need for precise etch-stop control and can fundamentally address the critical process window limitation that has plagued the conventional SOT-MTJ fabrication. In addition, the tunneling magnetoresistance (TMR) of as high as 125%, reliable electrical switching down to 2 ns and over <inline-formula> <tex-math>$10^{{12}}$ </tex-math></inline-formula> writing cycles are achieved in the device. The SARR SOT-MTJ with perpendicular magnetic anisotropy (PMA) exhibits a significant enhancement in thermal stability (<inline-formula> <tex-math>$\\Delta \\text {)}$ </tex-math></inline-formula> while achieving approximately 1.5X switching efficiency (<inline-formula> <tex-math>${\\Delta /}{I}_{{c}{0}}\\text {)}$ </tex-math></inline-formula> improvement when its short side matches the diameter of the conventional circular SOT-MTJ with PMA. We conclude that the proposed SARR SOT-MTJ device, featuring excellent performance, shows great potential in the development of large-scale SOT-MRAM chip.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 8","pages":"1345-1348"},"PeriodicalIF":4.5000,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11045959/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
We propose a novel manufacturing-friendly self-aligned rounded-rectangle (SARR) spin-orbit torque magnetic tunnel junction (SOT-MTJ) device, in which the rounded-rectangle-shaped MTJ pillar and SOT channel are defined by single-step etch process. Two via-type bottom electrodes (BEs) are located at both ends beneath the MTJ pillar, with their entire top surfaces covered by the MTJ pillar. This device architecture eliminates the need for precise etch-stop control and can fundamentally address the critical process window limitation that has plagued the conventional SOT-MTJ fabrication. In addition, the tunneling magnetoresistance (TMR) of as high as 125%, reliable electrical switching down to 2 ns and over $10^{{12}}$ writing cycles are achieved in the device. The SARR SOT-MTJ with perpendicular magnetic anisotropy (PMA) exhibits a significant enhancement in thermal stability ($\Delta \text {)}$ while achieving approximately 1.5X switching efficiency (${\Delta /}{I}_{{c}{0}}\text {)}$ improvement when its short side matches the diameter of the conventional circular SOT-MTJ with PMA. We conclude that the proposed SARR SOT-MTJ device, featuring excellent performance, shows great potential in the development of large-scale SOT-MRAM chip.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.