Yixin Xiong;Ajay K. Visvkarma;Rian Guan;Nathan S. Banner;Chan-Wen Chiu;Xiaojun Zheng;Suzanne E. Mohney;Thomas N. Jackson;Rongming Chu
{"title":"GaN Bootstrapping Amplifier IC Operating at up to 800 °C Temperature","authors":"Yixin Xiong;Ajay K. Visvkarma;Rian Guan;Nathan S. Banner;Chan-Wen Chiu;Xiaojun Zheng;Suzanne E. Mohney;Thomas N. Jackson;Rongming Chu","doi":"10.1109/LED.2025.3582714","DOIUrl":null,"url":null,"abstract":"A gallium nitride bootstrapping amplifier integrated circuit is demonstrated for high-temperature applications. The amplifier leverages bootstrapping gain-boosting technology and incorporates five monolithically integrated depletion-mode gallium nitride high electron mobility transistors, enabling an operation temperature up to 800°C in N2 environment. Those transistors feature a threshold voltage of approximately −2 V. Under a gate-to-source voltage of 5 V, the on-state current density decreased from 167 mA/mm at 25°C to 45 mA/mm at 800°C. At 25°C, the amplifier exhibits a DC gain of 26.3 dB with a unity gain frequency of 8.9 MHz. At 800°C, the amplifier delivers a DC gain of 31 dB and a unity gain frequency of 1.4 MHz. In addition, no significant degradation was observed after holding the transistor and amplifier unbiased for an hour at 800°C. This amplifier integrated circuit demonstrates the competitiveness of gallium nitride high electron mobility transistors as a promising technology for high-temperature electronics, up to 800°C.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 8","pages":"1309-1312"},"PeriodicalIF":4.5000,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11048918/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
A gallium nitride bootstrapping amplifier integrated circuit is demonstrated for high-temperature applications. The amplifier leverages bootstrapping gain-boosting technology and incorporates five monolithically integrated depletion-mode gallium nitride high electron mobility transistors, enabling an operation temperature up to 800°C in N2 environment. Those transistors feature a threshold voltage of approximately −2 V. Under a gate-to-source voltage of 5 V, the on-state current density decreased from 167 mA/mm at 25°C to 45 mA/mm at 800°C. At 25°C, the amplifier exhibits a DC gain of 26.3 dB with a unity gain frequency of 8.9 MHz. At 800°C, the amplifier delivers a DC gain of 31 dB and a unity gain frequency of 1.4 MHz. In addition, no significant degradation was observed after holding the transistor and amplifier unbiased for an hour at 800°C. This amplifier integrated circuit demonstrates the competitiveness of gallium nitride high electron mobility transistors as a promising technology for high-temperature electronics, up to 800°C.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.