Bo Chen;Yifan Wu;Yuwei Qu;Anlin Liu;Yuzhe Hu;Pengpeng Sang;Jixuan Wu;Xuepeng Zhan;Jiezhi Chen
{"title":"Cross-Temperature FeFETs Enabling Long- and Short-Term Memory for Reservoir Computing Network","authors":"Bo Chen;Yifan Wu;Yuwei Qu;Anlin Liu;Yuzhe Hu;Pengpeng Sang;Jixuan Wu;Xuepeng Zhan;Jiezhi Chen","doi":"10.1109/JEDS.2025.3585619","DOIUrl":null,"url":null,"abstract":"Hardware neural networks based on emerging nonvolatile memory are promising candidates to overcome the Von Neumann computing bottleneck. This study investigates the device characteristics and reliability of ferroelectric field-effect transistors (FeFETs) with a focus on their temperature-dependent performance. At 300 K, the FeFET demonstrates a 6.2 V memory window (MW) with 26.4% endurance degradation after 107 program/erase (P/E) cycles and 92.39% retention after 104 s. The accelerated charge trapping/detrapping dynamics enable superior short-term memory (STM) functionality. Remarkably, cryogenic operation at 77 K enhances the MW to 8 V while achieving exceptional stability with merely 0.4% degradation after 107 cycles and 99.02% retention at 104 seconds. The enhanced characteristics make it ideal for long-term memory (LTM) applications. Moreover, a reservoir computing (RC) network is proposed based on the cross-temperature FeFETs. By integrating the STM properties at 300 K and the LTM benefits at 77 K, the proposed RC network achieves a classification accuracy of 76.73% on the CIFAR-10 image recognition task. This surpasses the standalone results of 41.65% and 23.69% of 300 K and 77 K conditions, respectively. The findings highlight the potential to develop highly energy-efficient FeFET-based neuromorphic computing with varying temperature systems.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":"13 ","pages":"582-586"},"PeriodicalIF":2.0000,"publicationDate":"2025-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=11067954","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11067954/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Hardware neural networks based on emerging nonvolatile memory are promising candidates to overcome the Von Neumann computing bottleneck. This study investigates the device characteristics and reliability of ferroelectric field-effect transistors (FeFETs) with a focus on their temperature-dependent performance. At 300 K, the FeFET demonstrates a 6.2 V memory window (MW) with 26.4% endurance degradation after 107 program/erase (P/E) cycles and 92.39% retention after 104 s. The accelerated charge trapping/detrapping dynamics enable superior short-term memory (STM) functionality. Remarkably, cryogenic operation at 77 K enhances the MW to 8 V while achieving exceptional stability with merely 0.4% degradation after 107 cycles and 99.02% retention at 104 seconds. The enhanced characteristics make it ideal for long-term memory (LTM) applications. Moreover, a reservoir computing (RC) network is proposed based on the cross-temperature FeFETs. By integrating the STM properties at 300 K and the LTM benefits at 77 K, the proposed RC network achieves a classification accuracy of 76.73% on the CIFAR-10 image recognition task. This surpasses the standalone results of 41.65% and 23.69% of 300 K and 77 K conditions, respectively. The findings highlight the potential to develop highly energy-efficient FeFET-based neuromorphic computing with varying temperature systems.
期刊介绍:
The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.