Determination of biaxial stress and strain states of fibre-textured thin films by X-ray diffraction measurements

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-06-21 DOI:10.1016/j.tsf.2025.140728

Satyajit Sarkar , Fakhrodin Motazedian , Bashir Samsam Shariat , Dilusha Silva , Hong Yang , Yinong Liu

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引用次数: 0

Abstract

This paper reports a study on the determination of the internal stresses and elastic strains in thin films. The determination of these stresses and strains in thin films, especially those with strong fibre textures, is challenging. The method used is a combined technique of Bragg-Brentano and Asymmetric X-ray diffraction (XRD) configurations referred to as BBA-XRD. This method allows the use of conventional powder X-ray diffractometers to determine isotropic and anisotropic in-plane and out-of-plane strains of textured thin films. In this study, the internal stress and lattice strains of niobium (Nb) thin films deposited on nickel-titanium (NiTi) substrates in both as-deposited condition and after in-plane uniaxial tension were analysed using this method. The results obtained were verified by comparing with synchrotron grazing angle XRD measurements. The isotropic in-plane strains of the deposited Nb thin films were determined to be

ε_{x} = ε_{y} = - 1.73 %

and the out-of-plane strain was

ε_{z} = + 2.28 %

. After a uniaxial tensile in-plane deformation of the NiTi substrate by 6.1 % in the y direction, the anisotropic strain state of the film changed to

ε_{x} = - 2.03 %

ε_{y} = + 0.80 %

and

ε_{z} = + 0.80 %

. This paper also presents the specific conditions required for the BBA-XRD method to be applied to hexagonal, tetragonal, and rhombohedral crystal systems.

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用x射线衍射法测定纤维织构薄膜的双轴应力和应变状态

本文报道了薄膜内应力和弹性应变测定方法的研究。在薄膜中，特别是那些具有强纤维结构的薄膜中，这些应力和应变的测定是具有挑战性的。所使用的方法是Bragg-Brentano和不对称x射线衍射（XRD）构型（称为BBA-XRD）的组合技术。该方法允许使用传统的粉末x射线衍射仪来确定织构薄膜的各向同性和各向异性面内和面外应变。在本研究中，用该方法分析了沉积在镍钛（NiTi）衬底上的铌（Nb）薄膜在沉积状态和平面内单轴拉伸后的内应力和晶格应变。通过与同步加速器掠掠角XRD测量值的比较，验证了所得结果。测定所得Nb薄膜的面内各向同性应变为εx=εy= - 1.73%，面外应变为εz=+2.28%。在y方向单轴拉伸6.1%后，薄膜的各向异性应变状态变为εx=−2.03%,εy=+0.80%和εz=+0.80%。本文还介绍了BBA-XRD方法应用于六角形、四角形和菱形晶体体系的具体条件。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.