Comparative analysis of the emission properties of polar GaN/AlN and AlGaN/AlN multi-quantum wells

IF 4.6 2区 物理与天体物理 Q1 OPTICS
Kamil Koronski , Konrad Sakowski , Paweł Strak , Krzysztof P. Korona , Aleksandra Wierzbicka , Serhii Kryvyi , Kamil Sobczak , Rafal Jakiela , Eva Monroy , Stanislaw Krukowski , Agata Kaminska
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Abstract

The emission properties of GaN/AlN and Al0.08Ga0.92N/AlN polar multi-quantum wells (MQWs) have been investigated by photoluminescence (PL) and time-resolved PL (TRPL) measurements as a function of temperature and pressure. The results were correlated with ab initio calculations. The samples were grown by plasma-assisted molecular-beam epitaxy. Their structural/chemical features were characterised by X-ray diffraction (XRD), scanning transmission electron microscopy (STEM), and secondary ion mass spectrometry (SIMS). The well/barrier equal widths in the series of samples varied from 1.5 to 5 nm for GaN/AlN and from 2 to 4 nm for AlGaN/AlN MQWs, respectively. Due to the strong internal electric fields, both types of MQWs revealed some similarities in their optical properties: a redshift of the PL with increasing well width, a strong increase of the PL decay times, and a decrease of the pressure coefficients for wider wells. However, some differences were also observed: the emission energies of AlGaN/AlN structures were higher due to the presence of aluminium in the wells, activation energies were lower due to lower band offset, and internal quantum efficiencies and pressure coefficients were higher because of smaller lattice mismatch in AlGaN/AlN (weaker piezoelectric effects). The PL energies, oscillator strengths, and PL pressure dependencies were determined by density functional theory calculations, obtaining reasonable agreement with experimental measurements. Our analysis demonstrated a significant influence of piezoelectric effects on the emission properties of nitride-based QWs, and revealed that nonlinear processes are more important in the AlGaN/AlN system than in GaN/AlN, pointing to the presence of an additional mechanism of optical emission in AlGaN alloys.
极性GaN/AlN和AlGaN/AlN多量子阱发射特性的比较分析
利用光致发光(PL)和时间分辨发光(TRPL)技术研究了GaN/AlN和Al0.08Ga0.92N/AlN极性多量子阱(mqw)的发射特性随温度和压力的变化。结果与从头计算相关联。样品采用等离子体辅助分子束外延生长。通过x射线衍射(XRD)、扫描透射电子显微镜(STEM)和二次离子质谱(SIMS)表征了它们的结构/化学特征。在一系列样品中,GaN/AlN的井/势垒等宽度为1.5 ~ 5nm, AlGaN/AlN mqw的井/势垒等宽度为2 ~ 4nm。由于强大的内部电场,两种类型的mqw在光学性质上显示出一些相似之处:随着井宽的增加,PL红移,PL衰减时间的增加,以及更宽井的压力系数的降低。然而,也观察到一些差异:由于铝在井中存在,AlGaN/AlN结构的发射能量更高,由于较低的带偏移,活化能较低,并且由于AlGaN/AlN的晶格错配较小(压电效应较弱),内部量子效率和压力系数较高。通过密度泛函理论计算确定了PL能量、振子强度和PL压力依赖关系,与实验测量结果基本一致。我们的分析证明了压电效应对氮基量子阱发射特性的显著影响,并揭示了非线性过程在AlGaN/AlN体系中比在GaN/AlN体系中更为重要,这表明在AlGaN合金中存在额外的光学发射机制。
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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