A. Sanchez-Soares , T. Kelly , S.-K. Su , E. Chen , G. Fagas , J.C. Greer
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引用次数: 0
Abstract
Two-dimensional (2D) materials have attracted considerable interest for use as channel material in field-effect transistors (FETs) due to their potential for high packing densities and efficient electrostatic control. However, achieving low contact resistances remains a significant challenge for integrated circuit manufacture. This study presents a methodology that enables device simulations explicitly including the effects of contact stacks within a quantum mechanical framework. A means for optimizing device structures including contact effects is demonstrated and validated against experimental and ab initio data for metal–semimetal–semiconductor contacts for optimizing source/drain resistance in monolayer molybdenum disulfide (ML-MoS2) FETs.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.