{"title":"Effect of Nanosecond Pulse Parameters on Plasma Characteristics and Radical Concentrations in Water Cathodes","authors":"Haorui Xue;Yang Li;Wenhao Gao;Qi Yuan;Yuchen Cheng;Weidong Ding","doi":"10.1109/TPS.2025.3570988","DOIUrl":null,"url":null,"abstract":"Nanosecond pulsed plasma is a potential technology for wastewater treatment due to its high efficiency in driving plasma. In this article, a miniature needle water cathodes discharge structure based on the printed circuit board (PCB) technology is designed to achieve efficient plasma generation. The development process of plasma under nanosecond pulses was investigated, and the effects of pulse parameters on radical concentration, plasma temperature, and electron density were analyzed. In short-gap water cathode configurations, the initial tens of nanoseconds of the pulse dominate the optical signals. Initial secondary streamers span the entire gas gap. The absence of the <inline-formula> <tex-math>$\\mathrm{H}_{\\alpha }$ </tex-math></inline-formula> emission and the delayed appearance of OH(<italic>A</i>-<italic>X</i>) indicate that OH is primarily generated through molecular reactions rather than electron impact dissociation. Short pulse widths and short rise times facilitate efficient generation of radical concentrations and electron density. Increasing the voltage amplitude and repetition frequency enhances the inhomogeneity of the electron density but reduces the mean electron density due to plasma volume expansion. High-voltage amplitudes also elevate radical concentrations and plasma temperature. The increase of repetition frequency promotes energy deposition in the background gas, which raises the plasma temperature, leading to a stronger discharge and an increase in the yield of radicals.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1507-1517"},"PeriodicalIF":1.5000,"publicationDate":"2025-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/11026827/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
Nanosecond pulsed plasma is a potential technology for wastewater treatment due to its high efficiency in driving plasma. In this article, a miniature needle water cathodes discharge structure based on the printed circuit board (PCB) technology is designed to achieve efficient plasma generation. The development process of plasma under nanosecond pulses was investigated, and the effects of pulse parameters on radical concentration, plasma temperature, and electron density were analyzed. In short-gap water cathode configurations, the initial tens of nanoseconds of the pulse dominate the optical signals. Initial secondary streamers span the entire gas gap. The absence of the $\mathrm{H}_{\alpha }$ emission and the delayed appearance of OH(A-X) indicate that OH is primarily generated through molecular reactions rather than electron impact dissociation. Short pulse widths and short rise times facilitate efficient generation of radical concentrations and electron density. Increasing the voltage amplitude and repetition frequency enhances the inhomogeneity of the electron density but reduces the mean electron density due to plasma volume expansion. High-voltage amplitudes also elevate radical concentrations and plasma temperature. The increase of repetition frequency promotes energy deposition in the background gas, which raises the plasma temperature, leading to a stronger discharge and an increase in the yield of radicals.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.