Tunable Density-of-States in Chromium Oxide Thin Films via Room Temperature Laser Ablation

Angel Regalado-Contreras;Wencel de la Cruz
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Abstract

Chromium oxide thin films were deposited at room temperature, via reactive laser ablation under varying O2 pressures and analyzed using in-situ X-ray Photoelectron Spectroscopy. Cr 2p spectra exhibited spin-orbit splitting, with peak separations ranging from 9.2 to 9.5 eV. Cr3+, and Cr4+ states were identified, with 2p3/2 binding energies between 576.8 and 582.5 eV. Quantitative analysis confirmed that lower O2 pressures favored Cr2O3 growth, while higher pressures promoted CrO2. Near-Fermi-level spectra revealed significant Density-Of-States modulation, with the Valence Band Maximum shifting from 1.25 to 3.3 eV. A direct correlation between O2 pressure and electronic structure was established.
室温激光烧蚀氧化铬薄膜的可调态密度
在室温下,通过反应性激光烧蚀在不同的O2压力下沉积氧化铬薄膜,并使用原位x射线光电子能谱分析。cr2p光谱表现出自旋轨道分裂,峰值分离在9.2 ~ 9.5 eV之间。鉴定出Cr3+、Cr4+态,2p3/2结合能在576.8 ~ 582.5 eV之间。定量分析证实,较低的O2压力有利于Cr2O3的生长,而较高的O2压力有利于cr2的生长。近费米能级谱显示出明显的态密度调制,价带最大值从1.25 eV移至3.3 eV。建立了氧压力与电子结构之间的直接关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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