{"title":"Comparison of Output Characteristics of Vanadium-Compensated 4H-SiC PCSS at 1064 nm and 355 nm","authors":"Fuyin Liu;Ripin Wang;Ting He;Bohan Li;Yuchen Liu;Muyu Yi;Langning Wang;Tao Xun","doi":"10.1109/LED.2025.3564770","DOIUrl":null,"url":null,"abstract":"This letter investigates the differences in output characteristics of planar 4H-SiC photoconductive semiconductor switches (PCSS) at 355 nm and 1064 nm. Microwave experiments in the range of 0-2 GHz were conducted to test the response time of the PCSS. The modulation depth of microwave triggered by 355 nm is found to be slightly inferior to that triggered by 1064 nm. The comparative analysis of carrier lifetime calculations and two-dimensional numerical simulations reveal that the disparity between electron and hole lifetimes significantly contributes to the distinct response time between 355 nm and 1064 nm Under a bias electric field of 20 kV/mm, the photoelectric conversion efficiency of the device triggered by 355 nm is 54 times that of the device triggered by 1064 nm, and the power capacity can reach 1.36 MW.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 7","pages":"1147-1150"},"PeriodicalIF":4.1000,"publicationDate":"2025-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10978017/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
This letter investigates the differences in output characteristics of planar 4H-SiC photoconductive semiconductor switches (PCSS) at 355 nm and 1064 nm. Microwave experiments in the range of 0-2 GHz were conducted to test the response time of the PCSS. The modulation depth of microwave triggered by 355 nm is found to be slightly inferior to that triggered by 1064 nm. The comparative analysis of carrier lifetime calculations and two-dimensional numerical simulations reveal that the disparity between electron and hole lifetimes significantly contributes to the distinct response time between 355 nm and 1064 nm Under a bias electric field of 20 kV/mm, the photoelectric conversion efficiency of the device triggered by 355 nm is 54 times that of the device triggered by 1064 nm, and the power capacity can reach 1.36 MW.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.