Influence of the parameters of the reactive dual magnetron sputtering process on the properties of the ZrO2-Y2O3 electrolyte

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-06-11 DOI:10.1016/j.tsf.2025.140720

Andrey A. Solovyev , Anna V. Shipilova , Sergey V. Rabotkin , Vladimir O. Oskirko

{"title":"Influence of the parameters of the reactive dual magnetron sputtering process on the properties of the ZrO2-Y2O3 electrolyte","authors":"Andrey A. Solovyev , Anna V. Shipilova , Sergey V. Rabotkin , Vladimir O. Oskirko","doi":"10.1016/j.tsf.2025.140720","DOIUrl":null,"url":null,"abstract":"<div><div>Yttria-stabilized zirconia (YSZ) thin films, used as electrolytes in solid oxide fuel cells (SOFCs), have been deposited by reactive dual magnetron sputtering from single metal Zr and Y targets. Deposition was performed in poisoned mode using a high-power impulse magnetron sputtering power supply. The Y<sub>2</sub>O<sub>3</sub> content in YSZ films was varied by changing the Y magnetron power. YSZ films with a Y<sub>2</sub>O<sub>3</sub> content close to 8 mol % were obtained at Zr and Y magnetron powers of 1000 and 300 W, respectively, and a working pressure of 0.3 Pa. Anode-supported single cells with 5 µm thick YSZ electrolyte and La<sub>0.6</sub>Sr<sub>0.4</sub>CoO<sub>3</sub> cathode were fabricated and tested. An open circuit voltage of 1.05 V and a maximum power density of 868 mW/cm<sup>2</sup> were achieved at 800 °C using H<sub>2</sub> as fuel and air as oxidant. The structural and electrochemical characteristics of a single SOFCs with YSZ electrolyte deposited by dual magnetron sputtering of single metal Zr and Y targets and also Zr-Y alloy targets are compared. It has been found that the power supply parameters of the magnetron discharge, in particular the peak power density, affect the formation of residual stresses in the deposited films, leading to the formation of blister-like defects on the surface. This problem can be solved by reducing the peak power density of the discharge.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140720"},"PeriodicalIF":2.0000,"publicationDate":"2025-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609025001208","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}

引用次数: 0

Abstract

Yttria-stabilized zirconia (YSZ) thin films, used as electrolytes in solid oxide fuel cells (SOFCs), have been deposited by reactive dual magnetron sputtering from single metal Zr and Y targets. Deposition was performed in poisoned mode using a high-power impulse magnetron sputtering power supply. The Y₂O₃ content in YSZ films was varied by changing the Y magnetron power. YSZ films with a Y₂O₃ content close to 8 mol % were obtained at Zr and Y magnetron powers of 1000 and 300 W, respectively, and a working pressure of 0.3 Pa. Anode-supported single cells with 5 µm thick YSZ electrolyte and La_0.6Sr_0.4CoO₃ cathode were fabricated and tested. An open circuit voltage of 1.05 V and a maximum power density of 868 mW/cm² were achieved at 800 °C using H₂ as fuel and air as oxidant. The structural and electrochemical characteristics of a single SOFCs with YSZ electrolyte deposited by dual magnetron sputtering of single metal Zr and Y targets and also Zr-Y alloy targets are compared. It has been found that the power supply parameters of the magnetron discharge, in particular the peak power density, affect the formation of residual stresses in the deposited films, leading to the formation of blister-like defects on the surface. This problem can be solved by reducing the peak power density of the discharge.

查看原文本刊更多论文

反应性双磁控溅射工艺参数对ZrO2-Y2O3电解质性能的影响

采用反应性双磁控溅射技术，在单一金属Zr和Y靶上制备了钇稳定氧化锆（YSZ）薄膜，作为固体氧化物燃料电池（SOFCs）的电解质。采用大功率脉冲磁控溅射电源在中毒模式下进行沉积。YSZ薄膜中Y2O3的含量随Y磁控管功率的变化而变化。在Zr和Y磁控管功率分别为1000和300 W，工作压力为0.3 Pa的条件下，获得了Y2O3含量接近8mol %的YSZ薄膜。制备了5µm厚YSZ电解液和La0.6Sr0.4CoO3阴极的阳极支撑单体电池并进行了测试。在800℃下，以H2为燃料，空气为氧化剂，开路电压为1.05 V，最大功率密度为868 mW/cm2。比较了采用双磁控溅射法制备的单金属Zr和Y靶及Zr-Y合金靶的YSZ电解质单sofc的结构和电化学特性。研究发现，磁控管放电的电源参数，特别是峰值功率密度，会影响沉积膜中残余应力的形成，导致表面形成泡状缺陷。这个问题可以通过降低放电的峰值功率密度来解决。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.