Automatic phase aberration compensation for digital holographic microscopy by alternating weighted least squares fitting

Abstract

Digital holographic microscopy (DHM), which is an advanced quantitative phase-imaging technique, can be used to acquire amplitude and phase information from samples with high resolution and without the need for labeling. However, phase aberrations within the optical system significantly affect the accuracy of the quantitative phase imaging in DHM, especially in applications that involve complex samples and dynamic imaging. This paper proposes an automatic phase aberration compensation method based on alternating weighted least squares (AWLS) fitting. The method employs a variable splitting strategy to decompose the phase aberration problem into object and the aberration terms. By incorporating the alternating least squares (LS) method into the variable splitting strategy and utilizing the Tukey biweight function to dynamically adjust the weights in regions with high residuals, the method effectively reduces the influence of noise and outliers on fitting accuracy. Simulation and experimental results showed that the proposed method significantly outperforms traditional methods in terms of the phase aberration compensation accuracy and demonstrates strong adaptability to complex samples.