Vortex critical velocities in metallic-capped epitaxial NbN thin films

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
J.C. Zapata , Yeonkyu Lee , Jeehoon Kim , N. Haberkorn
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Abstract

We report the impact of proximity effects induced by different capping layers on the vortex dynamics and Larkin-Ovchinnikov instability in epitaxial NbN thin films. Bilayers consisting of 5 nm and 10 nm thick NbN were combined with capping layers of magnetic 5 nm thick Fe0.2Ni0.8 and non-magnetic 5 nm thick Al and 10 nm thick Pt. The critical temperature (Tc), which is approximately 16 K in pure samples, decreases due to the influence of the capping layers. This reduction is more pronounced for Fe0.2Ni0.8, where Tc is fully suppressed for 5 nm thick NbN and decreases to 10.1 K for 10 nm thick films. Additionally, Tc is restored when an ultrathin AlN insulating layer is introduced, preventing electronic interaction. In contrast, Al and Pt capping layers also reduce Tc, but to a lesser extent compared to magnetic layers. By performing current-voltage curves, we determined the vortex critical velocities as a function of the magnetic field. Initially, the velocities start at approximately 6 km/s at low fields, subsequently decreasing to values between 1.8–2.8 km/s at fields around 1 T While a negligible impact is observed at low fields, the velocities at moderate and high fields tend to increase near Tc for non-magnetic capping layers. These increases (approximately 20 %) may be attributed to changes in the quasiparticle relaxation time, likely due to phonon escape contributions, as well as modifications in the electron diffusion coefficient and heat dissipation to local heating generated by inhomogeneities. Comparatively, the impact of capping layers is significantly smaller than previously reported for NbN and other disordered superconductors, where the initial vortex velocities in pure films were much lower than those observed in the films used in this study.
金属帽外延NbN薄膜的涡临界速度
我们报道了不同封盖层引起的接近效应对外延NbN薄膜中涡旋动力学和拉金-奥夫钦尼科夫不稳定性的影响。由5 nm和10 nm厚度的NbN组成的双层膜与磁性5 nm厚的Fe0.2Ni0.8和非磁性5 nm厚的Al和10 nm厚的Pt盖层组合在一起。由于盖层的影响,纯样品的临界温度(Tc)降低了,约为16 K。这种降低在Fe0.2Ni0.8中更为明显,在5 nm厚的NbN中Tc被完全抑制,在10 nm厚的NbN中Tc降至10.1 K。此外,当引入超薄AlN绝缘层时,Tc恢复,防止电子相互作用。相比之下,Al和Pt封盖层也降低了Tc,但与磁性封盖层相比程度较小。通过计算电流-电压曲线,我们确定了涡旋临界速度作为磁场的函数。最初,低磁场的速度大约为6 km/s,随后在1 T左右的磁场中下降到1.8-2.8 km/s之间。在低磁场中观察到的影响可以忽略不计,而在中、高磁场中,对于非磁封盖层,在Tc附近的速度往往会增加。这些增加(大约20%)可能归因于准粒子弛豫时间的变化,可能是由于声子逸出的贡献,以及电子扩散系数的变化和不均匀性产生的局部加热的散热。相比之下,对于NbN和其他无序超导体,封盖层的影响明显小于先前报道的影响,其中纯薄膜中的初始涡旋速度远低于本研究中使用的薄膜中观察到的速度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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