Reconfigurable Ge Transistors Enabling Adaptive Differential Amplifiers

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Andreas Fuchsberger;Alexandra Dobler;Lukas Wind;Andreas Kramer;Julian Kulenkampff;Maximilian Reuter;Daniele Nazzari;Giulio Galderisi;Enrique Prado Navarrete;Johannes Aberl;Moritz Brehm;Thomas Mikolajick;Jens Trommer;Klaus Hofmann;Masiar Sistani;Walter M. Weber
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引用次数: 0

Abstract

Exploiting the capabilities of multi-gated transistors is a promising strategy for adaptive and compensative analog circuits. Typically, reconfigurable transistors, which can be switched between n- and p-type operation at runtime, are used as universal transistors in fine grain programmable digital circuits. However, in the analog domain, by operating the transistors deliberately in intermediate states, they enable adjustments to application-specific requirements and allow for compensation of undesired deviations. Here, we propose a Ge-on-SOI transistor circuit primitive that enables an adaptable circuit design featuring n- and p-type common source (CS) and drain circuits, with electrostatically tuneable output-to-input ratio. Most notably, combined experimental and simulation studies promote verification and scalability assessment. Finally, the first experimental evidence of the electrostatic compensation of transistor/circuitpath-related device-to-device inequalities is shown in a differential amplifier featuring adaptable gain.
可重构的Ge晶体管支持自适应差分放大器
利用多门晶体管的性能是一种很有前途的自适应和补偿模拟电路策略。通常,可重构晶体管可以在运行时在n型和p型操作之间切换,用作细粒度可编程数字电路中的通用晶体管。然而,在模拟领域,通过故意在中间状态下操作晶体管,它们可以根据特定的应用要求进行调整,并允许补偿不希望的偏差。在这里,我们提出了一种Ge-on-SOI晶体管电路原语,它能够实现具有n型和p型共源(CS)和漏极电路的自适应电路设计,具有静电可调谐的输出输入比。最值得注意的是,结合实验和模拟研究促进了验证和可扩展性评估。最后,在具有自适应增益的差分放大器中展示了晶体管/电路路径相关器件间不平等的静电补偿的第一个实验证据。
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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