{"title":"Layout Optimization of Dual-Directional SCR for Holding Voltage Equilibrium in ESD Applications","authors":"Feibo Du;Ruibo Chen;Yi Liu;Fei Hou;Xiaoyu Dong;Dongxing Gao;Jiaqiang Zheng;Zihan Zheng;Yimu Yang;Xuyao Wang;Zhiwei Liu","doi":"10.1109/TED.2025.3558487","DOIUrl":null,"url":null,"abstract":"The reverse holding voltage of high-voltage (HV) dual-directional silicon-controlled rectifier (DDSCR) is usually degraded to a very low level due to the ubiquitous substrate guard ring. In this article, two symmetrical dual-finger layout configurations of DDSCR (DDSCR-DF1 and DDSCR-DF2) are proposed to restrain the degradation of negative holding voltage. By suppressing the parasitic current paths associated with the p-type guard ring (PGR) in all directions, experimental results indicate that the DDSCR-DF2 can effectively shield the substrate parasitic effects, thereby restoring the high holding voltage characteristic inherent in DDSCR kernel. Moreover, the dual-finger layout configuration presented here can be extended to various existing HV DDSCRs, thus providing a very useful layout optimization method for HV Electrostatic discharge (ESD) engineering.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 6","pages":"2783-2788"},"PeriodicalIF":2.9000,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10965748/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The reverse holding voltage of high-voltage (HV) dual-directional silicon-controlled rectifier (DDSCR) is usually degraded to a very low level due to the ubiquitous substrate guard ring. In this article, two symmetrical dual-finger layout configurations of DDSCR (DDSCR-DF1 and DDSCR-DF2) are proposed to restrain the degradation of negative holding voltage. By suppressing the parasitic current paths associated with the p-type guard ring (PGR) in all directions, experimental results indicate that the DDSCR-DF2 can effectively shield the substrate parasitic effects, thereby restoring the high holding voltage characteristic inherent in DDSCR kernel. Moreover, the dual-finger layout configuration presented here can be extended to various existing HV DDSCRs, thus providing a very useful layout optimization method for HV Electrostatic discharge (ESD) engineering.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.