Computational study on the electronic structure, phonon, dynamic, thermal, and optical properties of XTe (X = Ga, Ge and GaGe) monolayers

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Nzar Rauf Abdullah , Botan Jawdat Abdullah , Vidar Gudmundsson
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引用次数: 0

Abstract

We perform an extensive investigation of two-dimensional, 2D, semiconductor structures consisting of hexagonal XTe (where X is Ga, Ge, or GaGe). The h-XTe have naturally planar buckling which effectively influences their physical properties. The buckling values of GaTe and GaGeTe are equal, and it is smaller than the buckling of GeTe. AIMD simulations confirm that the structure with lower buckling is more thermally stable than the higher buckled one and the phonon dispersion indicates all three considered monolayers are dynamically stable. A monolayer with higher buckling has stronger covalent interactions compared to lower buckled monolayers, and it thus induces stronger localization of electronic states, which often results in a larger band gap. This difference in the band gap due to planar buckling influences thermoelectric properties such as the Seebeck coefficient, and the power factor at the low temperature regime. On the other hand in the high temperature regime, a highly buckled structure exhibits low thermal properties such as heat capacity due to degenerate phonon bands. The optical properties reveal that all three monolayers primarily absorb in the IF region around the Fermi energy, while strong peaks in the optical conductivity are seen arising from absorption in the visible light region. A higher plasmon frequency is found for lower buckled monolayers compared to the more buckled ones. The XTe monolayers are exceptional promising for advanced applications in optoelectronics, plasmonics, and thermoelectrics, particularly when incorporated into nanodevices.
XTe (X = Ga, Ge和GaGe)单层的电子结构、声子、动力学、热学和光学性质的计算研究
我们对由六边形XTe(其中X是Ga、Ge或GaGe)组成的二维、二维半导体结构进行了广泛的研究。h-XTe具有自然的平面屈曲,这有效地影响了其物理性能。GaTe和GeTe的屈曲值相等,且小于GeTe的屈曲值。AIMD模拟证实,低屈曲结构比高屈曲结构更热稳定,声子色散表明所有三种考虑的单层都是动态稳定的。与低屈曲的单层相比,高屈曲的单层具有更强的共价相互作用,从而诱导更强的电子态局域化,这通常导致更大的带隙。这种由平面屈曲引起的带隙差异会影响热电性能,如塞贝克系数和低温状态下的功率因数。另一方面,在高温条件下,由于声子带简并,高屈曲结构表现出低热性能,如热容。光学性质表明,这三种单分子膜主要吸收费米能量附近的中频区,而可见光区吸收引起了光学导电性的强峰。较低屈曲单分子层的等离子体激元频率比屈曲多的单分子层高。XTe单层材料在光电子学、等离子体学和热电学的先进应用中具有特殊的前景,特别是在集成到纳米器件中时。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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