Improved cavitation erosion resistance of TiSiN/TiN multilayer coating with Al addition

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Ergeng Zhang , Jingwei Jiang , Dandan Liang , Qiang Chen , Qiong Zhou , Hanyin Ke , Shuni Ying
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引用次数: 0

Abstract

This work studied the effect of Al addition on the mechanical property and cavitation erosion resistance of TiSiN/TiN and TiSiN/TiAlN multilayer coatings. Adding Al into TiSiN/TiN elevates hardness from 17.8 GPa to 20.1 GPa and H³/E² ratio from 0.050 GPa to 0.082 GPa, while refining average grain size from 7.3 nm to 5.9 nm through substitutional solid solution formation. The modified TiSiN/TiAlN system demonstrates exceptional cavitation performance, extending incubation duration beyond 20 h with maximum mass loss rate reduced from 215 μg/h to 4 μg/h, compared to 12-hour incubation period of TiSiN/TiN coating. This notable enhancement is attributed to Al-induced grain refinement in the TiSiN/TiAlN coating, which increases toughness and enables efficient energy dissipation from cavitation pulses, thereby improving fatigue limit and delaying crack initiation.
Al的加入提高了TiSiN/TiN多层涂层的抗空化侵蚀性能
本文研究了Al的加入对TiSiN/TiN和TiSiN/TiAlN多层涂层力学性能和抗空泡侵蚀性能的影响。Al的加入使TiSiN/TiN的硬度从17.8 GPa提高到20.1 GPa, H³/E²比从0.050 GPa提高到0.082 GPa,同时通过取代固溶体的形成将平均晶粒尺寸从7.3 nm细化到5.9 nm。改进后的TiSiN/TiAlN体系具有优异的空化性能,与TiSiN/TiN涂层的12小时孵育时间相比,其孵育时间延长至20 h以上,最大质量损失率从215 μg/h降至4 μg/h。这种显著的增强归因于al诱导的TiSiN/TiAlN涂层中的晶粒细化,这增加了韧性,并使空化脉冲的能量有效耗散,从而提高了疲劳极限,延迟了裂纹的发生。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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